JPS57124468A - Manufacture of solid image pickup device - Google Patents

Manufacture of solid image pickup device

Info

Publication number
JPS57124468A
JPS57124468A JP56010671A JP1067181A JPS57124468A JP S57124468 A JPS57124468 A JP S57124468A JP 56010671 A JP56010671 A JP 56010671A JP 1067181 A JP1067181 A JP 1067181A JP S57124468 A JPS57124468 A JP S57124468A
Authority
JP
Japan
Prior art keywords
insulating film
electrode
heat treatment
executed
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56010671A
Other languages
Japanese (ja)
Other versions
JPS6141144B2 (en
Inventor
Masayoshi Ozaki
Yoshikazu Chatani
Osamu Kyogoku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP56010671A priority Critical patent/JPS57124468A/en
Publication of JPS57124468A publication Critical patent/JPS57124468A/en
Publication of JPS6141144B2 publication Critical patent/JPS6141144B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14665Imagers using a photoconductor layer

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

PURPOSE:To prevent the generation of a crack of a layer insulating film by each selecting the temperature of heat treatment in a hydrogen atmosphere executed after forming drain and source electrodes or an electrode for connecting a photoconductive film to predetermined value. CONSTITUTION:The source electrode 18a and the drain electrode 18a are each shaped to the source and drain regions 13, 14 of a silicon substrate 11 in which a large number of MOS transistors are molded, and the first heat treatment is executed at the temperature of 450 deg.C or higher in the hydrogen atmosphere. The drain electrode 18a is coated with the insulating film, the electrode 21 for connecting the photoconductive film, which ohmic-contacts with the source electrode 18b and extends onto the insulating film 19, is formed, heat treatment is executed at the temperature lower than that of the first heat treatment only by at least 5 deg.C in the hydrogen atmosphere, the photoconductive film 20 is shaped onto the surface, and the whole is heated. Accordingly, the alloying of the drain electrode and the silicon substrate hardly advances when forming the insulating film, and the crack of the insulating film can be prevented.
JP56010671A 1981-01-26 1981-01-26 Manufacture of solid image pickup device Granted JPS57124468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56010671A JPS57124468A (en) 1981-01-26 1981-01-26 Manufacture of solid image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56010671A JPS57124468A (en) 1981-01-26 1981-01-26 Manufacture of solid image pickup device

Publications (2)

Publication Number Publication Date
JPS57124468A true JPS57124468A (en) 1982-08-03
JPS6141144B2 JPS6141144B2 (en) 1986-09-12

Family

ID=11756707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56010671A Granted JPS57124468A (en) 1981-01-26 1981-01-26 Manufacture of solid image pickup device

Country Status (1)

Country Link
JP (1) JPS57124468A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016039328A (en) * 2014-08-08 2016-03-22 キヤノン株式会社 Photoelectric conversion device, imaging system, and method of manufacturing photoelectric conversion device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016039328A (en) * 2014-08-08 2016-03-22 キヤノン株式会社 Photoelectric conversion device, imaging system, and method of manufacturing photoelectric conversion device

Also Published As

Publication number Publication date
JPS6141144B2 (en) 1986-09-12

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