JPS57112013A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS57112013A
JPS57112013A JP18708780A JP18708780A JPS57112013A JP S57112013 A JPS57112013 A JP S57112013A JP 18708780 A JP18708780 A JP 18708780A JP 18708780 A JP18708780 A JP 18708780A JP S57112013 A JPS57112013 A JP S57112013A
Authority
JP
Japan
Prior art keywords
substrate
impurity
liquid layer
unevenness
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18708780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6325496B2 (enrdf_load_stackoverflow
Inventor
Seiichiro Kawamura
Motoo Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18708780A priority Critical patent/JPS57112013A/ja
Publication of JPS57112013A publication Critical patent/JPS57112013A/ja
Publication of JPS6325496B2 publication Critical patent/JPS6325496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Recrystallisation Techniques (AREA)
JP18708780A 1980-12-29 1980-12-29 Manufacture of semiconductor device Granted JPS57112013A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18708780A JPS57112013A (en) 1980-12-29 1980-12-29 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18708780A JPS57112013A (en) 1980-12-29 1980-12-29 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS57112013A true JPS57112013A (en) 1982-07-12
JPS6325496B2 JPS6325496B2 (enrdf_load_stackoverflow) 1988-05-25

Family

ID=16199882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18708780A Granted JPS57112013A (en) 1980-12-29 1980-12-29 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS57112013A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01109199U (enrdf_load_stackoverflow) * 1988-01-16 1989-07-24
JPH0326997U (enrdf_load_stackoverflow) * 1989-07-27 1991-03-19

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS566443A (en) * 1979-06-28 1981-01-23 Agency Of Ind Science & Technol Laser annealing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS566443A (en) * 1979-06-28 1981-01-23 Agency Of Ind Science & Technol Laser annealing method

Also Published As

Publication number Publication date
JPS6325496B2 (enrdf_load_stackoverflow) 1988-05-25

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