JPS6325496B2 - - Google Patents
Info
- Publication number
- JPS6325496B2 JPS6325496B2 JP55187087A JP18708780A JPS6325496B2 JP S6325496 B2 JPS6325496 B2 JP S6325496B2 JP 55187087 A JP55187087 A JP 55187087A JP 18708780 A JP18708780 A JP 18708780A JP S6325496 B2 JPS6325496 B2 JP S6325496B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- insulating film
- liquid
- annealing
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Toxicology (AREA)
- High Energy & Nuclear Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18708780A JPS57112013A (en) | 1980-12-29 | 1980-12-29 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18708780A JPS57112013A (en) | 1980-12-29 | 1980-12-29 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57112013A JPS57112013A (en) | 1982-07-12 |
| JPS6325496B2 true JPS6325496B2 (enrdf_load_stackoverflow) | 1988-05-25 |
Family
ID=16199882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18708780A Granted JPS57112013A (en) | 1980-12-29 | 1980-12-29 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57112013A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01109199U (enrdf_load_stackoverflow) * | 1988-01-16 | 1989-07-24 | ||
| JPH0326997U (enrdf_load_stackoverflow) * | 1989-07-27 | 1991-03-19 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS566443A (en) * | 1979-06-28 | 1981-01-23 | Agency Of Ind Science & Technol | Laser annealing method |
-
1980
- 1980-12-29 JP JP18708780A patent/JPS57112013A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01109199U (enrdf_load_stackoverflow) * | 1988-01-16 | 1989-07-24 | ||
| JPH0326997U (enrdf_load_stackoverflow) * | 1989-07-27 | 1991-03-19 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57112013A (en) | 1982-07-12 |
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