JPS5693326A - Holding structure of substrate and mask - Google Patents

Holding structure of substrate and mask

Info

Publication number
JPS5693326A
JPS5693326A JP17000979A JP17000979A JPS5693326A JP S5693326 A JPS5693326 A JP S5693326A JP 17000979 A JP17000979 A JP 17000979A JP 17000979 A JP17000979 A JP 17000979A JP S5693326 A JPS5693326 A JP S5693326A
Authority
JP
Japan
Prior art keywords
mask
substrate
crossing
right angles
projecting pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17000979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6241416B2 (enExample
Inventor
Shigetomo Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17000979A priority Critical patent/JPS5693326A/ja
Publication of JPS5693326A publication Critical patent/JPS5693326A/ja
Publication of JPS6241416B2 publication Critical patent/JPS6241416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP17000979A 1979-12-26 1979-12-26 Holding structure of substrate and mask Granted JPS5693326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Publications (2)

Publication Number Publication Date
JPS5693326A true JPS5693326A (en) 1981-07-28
JPS6241416B2 JPS6241416B2 (enExample) 1987-09-02

Family

ID=15896889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17000979A Granted JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Country Status (1)

Country Link
JP (1) JPS5693326A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139876A1 (ja) * 2007-05-10 2008-11-20 Ulvac, Inc. 位置合わせ装置、成膜装置
JP2016514369A (ja) * 2013-03-15 2016-05-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板用キャリア及び基板搬送方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139876A1 (ja) * 2007-05-10 2008-11-20 Ulvac, Inc. 位置合わせ装置、成膜装置
JP2016514369A (ja) * 2013-03-15 2016-05-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板用キャリア及び基板搬送方法

Also Published As

Publication number Publication date
JPS6241416B2 (enExample) 1987-09-02

Similar Documents

Publication Publication Date Title
JPS5693326A (en) Holding structure of substrate and mask
JPS5510855A (en) Method of manufacturing composite rotor
AR218023A1 (es) Procedimiento para la preparacion de enzima alpha-amilasa estable al calor y a los acidos y procedimiento para convertir almidon a un hidrolizado de almidon,mediante la enzima asi obtenida
JPS566994A (en) Membrane support structure for low-temperature tank
JPS5351580A (en) Headstock
SU694719A1 (ru) Опора дл трубопровода
JPS55100418A (en) Rotary mechanism
JPS52129054A (en) Heat exchanger
JPS54118949A (en) Supporting device for rotary machine
FR2350404A1 (fr) Procede de traitement thermique de pieces en matieres refractaires, notamment d'ailettes de turbines a gaz
JPS52119071A (en) Supporting method for semiconductor element
JPS5541279A (en) Resin enclosing device
JPS53108764A (en) Diffusion jig of semiconductor wafers
JPS57208318A (en) Support structure for bearing
JPS5450349A (en) Production of glass package
JPS5361268A (en) Production of semiconductor device
Tsypin Mechanical Properties of Solid Solutions on a Copper Base
JPS5232531A (en) Power transformer
ES351639A1 (es) Una disposicion de estructura de soporte de reactor nucle- ar.
Eschnauer et al. Process for the Production of Protective Surface Layers
JPS5312533A (en) Supporter for heating element used in fixing process
JPS5287516A (en) Thermal reactor
JPS6472799A (en) Iron
ARIMAN et al. Thermal stresses in plates with circular holes(Temperature and membrane thermal stress distribution in finite rectangular plate with insulated circular hole, considering steady state heat conduction equation)
Trefilov et al. Effect of the Cooling Medium on the Low-Temperature Deformation of Cr-Ni Steel