JPS6241416B2 - - Google Patents

Info

Publication number
JPS6241416B2
JPS6241416B2 JP17000979A JP17000979A JPS6241416B2 JP S6241416 B2 JPS6241416 B2 JP S6241416B2 JP 17000979 A JP17000979 A JP 17000979A JP 17000979 A JP17000979 A JP 17000979A JP S6241416 B2 JPS6241416 B2 JP S6241416B2
Authority
JP
Japan
Prior art keywords
mask
substrate
base
holding structure
intersection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17000979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5693326A (en
Inventor
Shigetomo Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17000979A priority Critical patent/JPS5693326A/ja
Publication of JPS5693326A publication Critical patent/JPS5693326A/ja
Publication of JPS6241416B2 publication Critical patent/JPS6241416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP17000979A 1979-12-26 1979-12-26 Holding structure of substrate and mask Granted JPS5693326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Publications (2)

Publication Number Publication Date
JPS5693326A JPS5693326A (en) 1981-07-28
JPS6241416B2 true JPS6241416B2 (enExample) 1987-09-02

Family

ID=15896889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17000979A Granted JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Country Status (1)

Country Link
JP (1) JPS5693326A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139876A1 (ja) * 2007-05-10 2008-11-20 Ulvac, Inc. 位置合わせ装置、成膜装置
EP2971225B1 (en) * 2013-03-15 2017-02-22 Applied Materials, Inc. Carrier for a substrate and method for carrying a substrate

Also Published As

Publication number Publication date
JPS5693326A (en) 1981-07-28

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