JPS5693326A - Holding structure of substrate and mask - Google Patents

Holding structure of substrate and mask

Info

Publication number
JPS5693326A
JPS5693326A JP17000979A JP17000979A JPS5693326A JP S5693326 A JPS5693326 A JP S5693326A JP 17000979 A JP17000979 A JP 17000979A JP 17000979 A JP17000979 A JP 17000979A JP S5693326 A JPS5693326 A JP S5693326A
Authority
JP
Japan
Prior art keywords
mask
substrate
crossing
right angles
projecting pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17000979A
Other languages
Japanese (ja)
Other versions
JPS6241416B2 (en
Inventor
Shigetomo Sawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17000979A priority Critical patent/JPS5693326A/en
Publication of JPS5693326A publication Critical patent/JPS5693326A/en
Publication of JPS6241416B2 publication Critical patent/JPS6241416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Abstract

PURPOSE:To diminish extremely the generation of relative positional discrepancy between the mask and the substrate by a method wherein two lines crossing at right angles being constituted of projecting pieces to be used as the positional standard against the mask and the substrate to be put on the upper face of the mask are made to be the cardinal points against the change to be caused by thermal expansion. CONSTITUTION:The metal mask 6 is put on a base stand 5 making the two side lines to come in contact with the projecting pieces 2-4 being equipped along the two circumferential side lines crossing at right angles of a central square opening 51 providing in the base stand. The mask supporting part 61 at the outside neighborhood of the crossing part at right angles is fixed on the base stand 5. The substrate 1 is put on the mask 6 in this constitution, and when they are heated at a prescribed temperature, because the mask 6 is fixed at the neighborhood of crossing point of two side lines crossing at right angles to be used as the standard lines, so that the mask expands thermally in the radial direction making the crossing point as the standard point. But in this condition, the rotational freedom around the standard point is yet remained, therefore the rotation is suppressed by the projecting pieces 2-4. Moreover the substrate 1 on the mask 6 is pressed in the perpendicular directions by plate springs 8, and their acting force is supported by the projecting pieces 2-4. Therefore the generation of positional discrepancy between the mask 6 and the substrate 1 can be diminished extremely.
JP17000979A 1979-12-26 1979-12-26 Holding structure of substrate and mask Granted JPS5693326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17000979A JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Publications (2)

Publication Number Publication Date
JPS5693326A true JPS5693326A (en) 1981-07-28
JPS6241416B2 JPS6241416B2 (en) 1987-09-02

Family

ID=15896889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17000979A Granted JPS5693326A (en) 1979-12-26 1979-12-26 Holding structure of substrate and mask

Country Status (1)

Country Link
JP (1) JPS5693326A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139876A1 (en) * 2007-05-10 2008-11-20 Ulvac, Inc. Positioning device and film-forming device
JP2016514369A (en) * 2013-03-15 2016-05-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Substrate carrier and substrate transfer method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008139876A1 (en) * 2007-05-10 2008-11-20 Ulvac, Inc. Positioning device and film-forming device
JP2016514369A (en) * 2013-03-15 2016-05-19 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Substrate carrier and substrate transfer method

Also Published As

Publication number Publication date
JPS6241416B2 (en) 1987-09-02

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