JPS5691362A - Axial alignment of electron beam device - Google Patents

Axial alignment of electron beam device

Info

Publication number
JPS5691362A
JPS5691362A JP16782779A JP16782779A JPS5691362A JP S5691362 A JPS5691362 A JP S5691362A JP 16782779 A JP16782779 A JP 16782779A JP 16782779 A JP16782779 A JP 16782779A JP S5691362 A JPS5691362 A JP S5691362A
Authority
JP
Japan
Prior art keywords
alignment
electron
electronic
cross
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16782779A
Other languages
Japanese (ja)
Inventor
Akio Ito
Masahiro Okabe
Toshihiro Ishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16782779A priority Critical patent/JPS5691362A/en
Publication of JPS5691362A publication Critical patent/JPS5691362A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To perform the axial alignment work accurately and efficiently, by performing the alignment sequentially while bringing the electron lens into operational condition one by one. CONSTITUTION:A specimen face 16 and an electronic detector 34 are placed below an electron beam device comprising an electron gun, electronic lens, objective iris, deflector and an alignment coil, and the output is provided to a scanning type indicator 36 connected to a saw toth wave generator 38. At first only the electronic lens 18 is functioned to forcus the cross-over image of the electron beams onto an objective iris 24, then the electron passed through said iris 24 is received by a detector 34 to be visually indicated on a scan type indicator 36 to adjust the shifting of the cross-over image. Thereafte the second and third electronic lenses 20, 22 are independently functioned to adjust the shifting of the cross-over image similarly thus to perform the axial alignment. Since the alignment is performed while bringing the electronic lens into operation one by one, accurate alignment can be performed with simple additional machineries.
JP16782779A 1979-12-24 1979-12-24 Axial alignment of electron beam device Pending JPS5691362A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16782779A JPS5691362A (en) 1979-12-24 1979-12-24 Axial alignment of electron beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16782779A JPS5691362A (en) 1979-12-24 1979-12-24 Axial alignment of electron beam device

Publications (1)

Publication Number Publication Date
JPS5691362A true JPS5691362A (en) 1981-07-24

Family

ID=15856824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16782779A Pending JPS5691362A (en) 1979-12-24 1979-12-24 Axial alignment of electron beam device

Country Status (1)

Country Link
JP (1) JPS5691362A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5353412U (en) * 1976-10-07 1978-05-08
JPS5457950A (en) * 1977-10-18 1979-05-10 Erionikusu Kk Method of focusing in electron beam unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5353412U (en) * 1976-10-07 1978-05-08
JPS5457950A (en) * 1977-10-18 1979-05-10 Erionikusu Kk Method of focusing in electron beam unit

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