JPS5457950A - Method of focusing in electron beam unit - Google Patents
Method of focusing in electron beam unitInfo
- Publication number
- JPS5457950A JPS5457950A JP12484177A JP12484177A JPS5457950A JP S5457950 A JPS5457950 A JP S5457950A JP 12484177 A JP12484177 A JP 12484177A JP 12484177 A JP12484177 A JP 12484177A JP S5457950 A JPS5457950 A JP S5457950A
- Authority
- JP
- Japan
- Prior art keywords
- focusing
- electron beam
- beam unit
- unit
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12484177A JPS5457950A (en) | 1977-10-18 | 1977-10-18 | Method of focusing in electron beam unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12484177A JPS5457950A (en) | 1977-10-18 | 1977-10-18 | Method of focusing in electron beam unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5457950A true JPS5457950A (en) | 1979-05-10 |
Family
ID=14895408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12484177A Pending JPS5457950A (en) | 1977-10-18 | 1977-10-18 | Method of focusing in electron beam unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5457950A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5691362A (en) * | 1979-12-24 | 1981-07-24 | Fujitsu Ltd | Axial alignment of electron beam device |
JPS5740842A (en) * | 1980-08-22 | 1982-03-06 | Jeol Ltd | Electron beam adjusting method |
JPS59103255A (en) * | 1982-12-03 | 1984-06-14 | Jeol Ltd | Alignment device for charged particle beam apparatus |
JPH10134746A (en) * | 1996-10-29 | 1998-05-22 | Seiko Instr Inc | Optical axis adjustment method for focused ion beam and focused ion beam device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186358A (en) * | 1975-01-27 | 1976-07-28 | Nippon Electron Optics Lab | DENSHISENSOCHINIOKERUBIIMUJUKUAWASEHOHOOYOBISOCHI |
JPS51137369A (en) * | 1975-05-23 | 1976-11-27 | Hitachi Ltd | Automatic shaft alignment unit for electron optics system |
-
1977
- 1977-10-18 JP JP12484177A patent/JPS5457950A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186358A (en) * | 1975-01-27 | 1976-07-28 | Nippon Electron Optics Lab | DENSHISENSOCHINIOKERUBIIMUJUKUAWASEHOHOOYOBISOCHI |
JPS51137369A (en) * | 1975-05-23 | 1976-11-27 | Hitachi Ltd | Automatic shaft alignment unit for electron optics system |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5691362A (en) * | 1979-12-24 | 1981-07-24 | Fujitsu Ltd | Axial alignment of electron beam device |
JPS5740842A (en) * | 1980-08-22 | 1982-03-06 | Jeol Ltd | Electron beam adjusting method |
JPS59103255A (en) * | 1982-12-03 | 1984-06-14 | Jeol Ltd | Alignment device for charged particle beam apparatus |
JPH0332851B2 (en) * | 1982-12-03 | 1991-05-15 | Nippon Electron Optics Lab | |
JPH10134746A (en) * | 1996-10-29 | 1998-05-22 | Seiko Instr Inc | Optical axis adjustment method for focused ion beam and focused ion beam device |
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