JPS5457950A - Method of focusing in electron beam unit - Google Patents

Method of focusing in electron beam unit

Info

Publication number
JPS5457950A
JPS5457950A JP12484177A JP12484177A JPS5457950A JP S5457950 A JPS5457950 A JP S5457950A JP 12484177 A JP12484177 A JP 12484177A JP 12484177 A JP12484177 A JP 12484177A JP S5457950 A JPS5457950 A JP S5457950A
Authority
JP
Japan
Prior art keywords
focusing
electron beam
beam unit
unit
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12484177A
Other languages
Japanese (ja)
Inventor
Masanao Hotsuta
Hideyuki Ooi
Tadao Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ERIONIKUSU KK
Original Assignee
ERIONIKUSU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ERIONIKUSU KK filed Critical ERIONIKUSU KK
Priority to JP12484177A priority Critical patent/JPS5457950A/en
Publication of JPS5457950A publication Critical patent/JPS5457950A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP12484177A 1977-10-18 1977-10-18 Method of focusing in electron beam unit Pending JPS5457950A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12484177A JPS5457950A (en) 1977-10-18 1977-10-18 Method of focusing in electron beam unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12484177A JPS5457950A (en) 1977-10-18 1977-10-18 Method of focusing in electron beam unit

Publications (1)

Publication Number Publication Date
JPS5457950A true JPS5457950A (en) 1979-05-10

Family

ID=14895408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12484177A Pending JPS5457950A (en) 1977-10-18 1977-10-18 Method of focusing in electron beam unit

Country Status (1)

Country Link
JP (1) JPS5457950A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691362A (en) * 1979-12-24 1981-07-24 Fujitsu Ltd Axial alignment of electron beam device
JPS5740842A (en) * 1980-08-22 1982-03-06 Jeol Ltd Electron beam adjusting method
JPS59103255A (en) * 1982-12-03 1984-06-14 Jeol Ltd Alignment device for charged particle beam apparatus
JPH10134746A (en) * 1996-10-29 1998-05-22 Seiko Instr Inc Optical axis adjustment method for focused ion beam and focused ion beam device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186358A (en) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab DENSHISENSOCHINIOKERUBIIMUJUKUAWASEHOHOOYOBISOCHI
JPS51137369A (en) * 1975-05-23 1976-11-27 Hitachi Ltd Automatic shaft alignment unit for electron optics system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186358A (en) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab DENSHISENSOCHINIOKERUBIIMUJUKUAWASEHOHOOYOBISOCHI
JPS51137369A (en) * 1975-05-23 1976-11-27 Hitachi Ltd Automatic shaft alignment unit for electron optics system

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691362A (en) * 1979-12-24 1981-07-24 Fujitsu Ltd Axial alignment of electron beam device
JPS5740842A (en) * 1980-08-22 1982-03-06 Jeol Ltd Electron beam adjusting method
JPS59103255A (en) * 1982-12-03 1984-06-14 Jeol Ltd Alignment device for charged particle beam apparatus
JPH0332851B2 (en) * 1982-12-03 1991-05-15 Nippon Electron Optics Lab
JPH10134746A (en) * 1996-10-29 1998-05-22 Seiko Instr Inc Optical axis adjustment method for focused ion beam and focused ion beam device

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