JPS5685879A - Gap green light emitting diode - Google Patents
Gap green light emitting diodeInfo
- Publication number
- JPS5685879A JPS5685879A JP16270179A JP16270179A JPS5685879A JP S5685879 A JPS5685879 A JP S5685879A JP 16270179 A JP16270179 A JP 16270179A JP 16270179 A JP16270179 A JP 16270179A JP S5685879 A JPS5685879 A JP S5685879A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gap
- type gap
- light emitting
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 abstract 3
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 230000000717 retained effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To obtain a GaP green LED having high light emission efficiency by accumulating an N type GaP epitaxial grown layer having a thickness of approx. 15mum on an N type GaP monocrystalline substrate. CONSTITUTION:A boat 11 is filled in an epitaxial growth furnace, and the furnace is heated to 1,000 deg.C while feeding H2 gas thereto. Thereafter, a slider 12 is operated, and Ga solution 13 is adhered in a predetermined thickness on a semiconductor substrate 16. Subsequently, the furnace temperature is decreased to 950 deg.C, and an Si-doped N type GaP epitaxially grown layer 2 is formed on the substrate 16. Atmospheric gas is exchanged from the H2 to (Ar+NH3) gas after a predetermined time, is cooled to 900 deg.C, and N-doped P type GaP epitaxially grown layer 4 is accuuated in approx. 15mum. The atmospheric gas is then exchanged to Zn gas, is retained to 900 deg.C for a predetermined time, is then decreased to 800 deg.C, and the layer 4 is grown. Thus, a GaP green LED having perferable light emitting ef ficiency can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16270179A JPS5685879A (en) | 1979-12-17 | 1979-12-17 | Gap green light emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16270179A JPS5685879A (en) | 1979-12-17 | 1979-12-17 | Gap green light emitting diode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5685879A true JPS5685879A (en) | 1981-07-13 |
Family
ID=15759652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16270179A Pending JPS5685879A (en) | 1979-12-17 | 1979-12-17 | Gap green light emitting diode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5685879A (en) |
-
1979
- 1979-12-17 JP JP16270179A patent/JPS5685879A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7255742B2 (en) | Method of manufacturing Group III nitride crystals, method of manufacturing semiconductor substrate, Group III nitride crystals, semiconductor substrate, and electronic device | |
CN111725371B (en) | LED epitaxial bottom layer structure and growth method thereof | |
CN105679898B (en) | LED epitaxial structure and its growing method with warpage adjustment structure layer | |
JPS5685879A (en) | Gap green light emitting diode | |
JPH03211888A (en) | Semiconductor device and manufacture thereof | |
EP0685892A3 (en) | Method for producing light-emitting diode | |
JPH10214993A (en) | Epitaxial wafer and its manufacture as well as light-emitting diode | |
JPS5453974A (en) | Manufacture for gallium phosphide green light emitting element | |
JPS5624985A (en) | Manufacture of gallium phosphide green light emitting element | |
JPS5453977A (en) | Manufacture for gallium phosphide green light emitting element | |
JPS561528A (en) | Manufacture of epitaxial wafer of 3-5 group compound semiconductor | |
JPS55124280A (en) | Method of fabricating light emitting diode | |
JPS5778132A (en) | Liquid phase epitaxial growing method | |
JPS57183079A (en) | Gallium phosphate multi-color light emission diode | |
JPS561529A (en) | Manufacture of epitaxial wafer of 3-5 group compound semiconductor | |
JPS5479579A (en) | Manufacture of gap green light emission diode | |
JPS5775420A (en) | Gallium phosphide epitaxial wafer and manufacture thereof | |
JPS5918686A (en) | Gallium phosphide light emitting diode | |
JPS5451493A (en) | Semiconductor light emitting device | |
JPS52103399A (en) | Production of gallium nitride | |
JPS54162494A (en) | Gallium-phosphide green light emitting element | |
JPS5629382A (en) | Light emitting device of double hetero structure and manufacture thereof | |
KR790000518B1 (en) | Method of producing gallium phosphide redlight emission diode | |
JPS5588381A (en) | Preparation of gallium phosphide red light-emitting diode | |
JPS5775421A (en) | Method of vapor growth compound semiconductor epitaxial film |