JPS5674929A - Insulating layer forming method - Google Patents

Insulating layer forming method

Info

Publication number
JPS5674929A
JPS5674929A JP15185279A JP15185279A JPS5674929A JP S5674929 A JPS5674929 A JP S5674929A JP 15185279 A JP15185279 A JP 15185279A JP 15185279 A JP15185279 A JP 15185279A JP S5674929 A JPS5674929 A JP S5674929A
Authority
JP
Japan
Prior art keywords
concentration
injected
ion
layer
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15185279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6212658B2 (enFirst
Inventor
Takayoshi Hayashi
Hamao Okamoto
Yoshikazu Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15185279A priority Critical patent/JPS5674929A/ja
Publication of JPS5674929A publication Critical patent/JPS5674929A/ja
Publication of JPS6212658B2 publication Critical patent/JPS6212658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

Landscapes

  • Formation Of Insulating Films (AREA)
JP15185279A 1979-11-22 1979-11-22 Insulating layer forming method Granted JPS5674929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15185279A JPS5674929A (en) 1979-11-22 1979-11-22 Insulating layer forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15185279A JPS5674929A (en) 1979-11-22 1979-11-22 Insulating layer forming method

Publications (2)

Publication Number Publication Date
JPS5674929A true JPS5674929A (en) 1981-06-20
JPS6212658B2 JPS6212658B2 (enFirst) 1987-03-19

Family

ID=15527668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15185279A Granted JPS5674929A (en) 1979-11-22 1979-11-22 Insulating layer forming method

Country Status (1)

Country Link
JP (1) JPS5674929A (enFirst)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3139904B2 (ja) * 1993-12-28 2001-03-05 新日本製鐵株式会社 半導体基板の製造方法および製造装置
KR102482185B1 (ko) 2022-09-15 2022-12-29 (주)코리아테크 스틱형 용기
KR102484068B1 (ko) 2021-10-22 2023-01-04 (주)코리아테크 스틱형 용기

Also Published As

Publication number Publication date
JPS6212658B2 (enFirst) 1987-03-19

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