JPS5671969A - Semiconductor element - Google Patents
Semiconductor elementInfo
- Publication number
- JPS5671969A JPS5671969A JP14896679A JP14896679A JPS5671969A JP S5671969 A JPS5671969 A JP S5671969A JP 14896679 A JP14896679 A JP 14896679A JP 14896679 A JP14896679 A JP 14896679A JP S5671969 A JPS5671969 A JP S5671969A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- layer
- base
- plate
- emitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Thyristors (AREA)
Abstract
PURPOSE:To prevent a short-circuit with an electrode plate by reducing a film thickness of a part or removing a part at a lower position of an electrode plate of a base electrode. CONSTITUTION:A P<+> base layer 3' and an N<+> emitter layer 4 exist on an N<+> type Si substrate 2, and Al electrode layers 4b, 4e are formed, respectively. On the superficial layer of this part, Al is sintered to form 5b, and 5e. An electrode piping is lead out as such that an emitter electrode is split and formed at higher level than a base electrode and an Mo electrode plate 10 is pressure contacted. The thickness of the base electrode is reduced or removed by etching, however, in case of removing, it is lead to a residual peripheral electrode 4b through the layer 5b. An element surface between each electrode layer is coated with SiO2 6 and further, SiO2 16 is laminated. With this constitution, the Mo plate 10 is pressure contacted only by an emitter electrode, thus, being not short-circuited with a base electrode and further, yield and reliability being improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14896679A JPS5671969A (en) | 1979-11-19 | 1979-11-19 | Semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14896679A JPS5671969A (en) | 1979-11-19 | 1979-11-19 | Semiconductor element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5671969A true JPS5671969A (en) | 1981-06-15 |
JPS6226591B2 JPS6226591B2 (en) | 1987-06-09 |
Family
ID=15464639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14896679A Granted JPS5671969A (en) | 1979-11-19 | 1979-11-19 | Semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5671969A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60166152U (en) * | 1984-04-11 | 1985-11-05 | 株式会社明電舎 | Electrode extraction structure of power semiconductor devices |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5418133U (en) * | 1977-07-08 | 1979-02-06 |
-
1979
- 1979-11-19 JP JP14896679A patent/JPS5671969A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5418133U (en) * | 1977-07-08 | 1979-02-06 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60166152U (en) * | 1984-04-11 | 1985-11-05 | 株式会社明電舎 | Electrode extraction structure of power semiconductor devices |
JPH0526772Y2 (en) * | 1984-04-11 | 1993-07-07 |
Also Published As
Publication number | Publication date |
---|---|
JPS6226591B2 (en) | 1987-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5671969A (en) | Semiconductor element | |
JPS5579447A (en) | Photomask substrate and photomask | |
JPS57204165A (en) | Manufacture of charge coupling element | |
JPS5666065A (en) | Semiconductor memory unit | |
JPS6437535A (en) | Thin film semiconductor element | |
GB1044689A (en) | Improvements in or relating to mountings for semi-conductor devices | |
JPS5267963A (en) | Manufacture of semiconductor unit | |
JPS54107264A (en) | Semiconductor device | |
JPS57116346A (en) | Photoconductive material | |
JPS56138946A (en) | Semiconductor device | |
JPS5636159A (en) | Schottky diode | |
JPS5727055A (en) | Semiconductor device | |
JPS5317286A (en) | Production of semiconductor device | |
JPS5633855A (en) | Semiconductor device and its manufacture | |
JPS57208160A (en) | Semiconductor device | |
JPS5440077A (en) | Manufacture of semiconductor integrated circuit device substrate | |
JPS57117280A (en) | Semiconductor device and manufacture thereof | |
JPS57173958A (en) | Semiconductor ic device | |
JPS5578568A (en) | Manufacture of semiconductor device | |
JPS5683080A (en) | Schottky-barrier-diode | |
JPS5624939A (en) | Manufacture of semiconductor device | |
JPS55141754A (en) | Semiconductor element | |
JPS5613733A (en) | Forming method for electrode | |
JPS5799755A (en) | Semiconductor device, to lower section of scribed line thereof isolation region is formed | |
JPS56122160A (en) | Thin film circuit device |