JPS5669855A - Semiconductor device and its manufacture - Google Patents

Semiconductor device and its manufacture

Info

Publication number
JPS5669855A
JPS5669855A JP14573879A JP14573879A JPS5669855A JP S5669855 A JPS5669855 A JP S5669855A JP 14573879 A JP14573879 A JP 14573879A JP 14573879 A JP14573879 A JP 14573879A JP S5669855 A JPS5669855 A JP S5669855A
Authority
JP
Japan
Prior art keywords
mask
corner section
well region
well
corner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14573879A
Other languages
English (en)
Other versions
JPS6031109B2 (ja
Inventor
Takeo Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP54145738A priority Critical patent/JPS6031109B2/ja
Priority to DE8080101439T priority patent/DE3063943D1/de
Priority to EP80101439A priority patent/EP0018487B1/en
Publication of JPS5669855A publication Critical patent/JPS5669855A/ja
Priority to US06/451,412 priority patent/US4533932A/en
Publication of JPS6031109B2 publication Critical patent/JPS6031109B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0927Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising a P-well only in the substrate
JP54145738A 1979-03-22 1979-11-10 半導体装置及びその製造方法 Expired JPS6031109B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP54145738A JPS6031109B2 (ja) 1979-11-10 1979-11-10 半導体装置及びその製造方法
DE8080101439T DE3063943D1 (en) 1979-03-22 1980-03-19 Semiconductor device and manufacturing method thereof
EP80101439A EP0018487B1 (en) 1979-03-22 1980-03-19 Semiconductor device and manufacturing method thereof
US06/451,412 US4533932A (en) 1979-03-22 1982-12-20 Semiconductor device with enlarged corners to provide enhanced punch through protection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54145738A JPS6031109B2 (ja) 1979-11-10 1979-11-10 半導体装置及びその製造方法

Publications (2)

Publication Number Publication Date
JPS5669855A true JPS5669855A (en) 1981-06-11
JPS6031109B2 JPS6031109B2 (ja) 1985-07-20

Family

ID=15391995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54145738A Expired JPS6031109B2 (ja) 1979-03-22 1979-11-10 半導体装置及びその製造方法

Country Status (1)

Country Link
JP (1) JPS6031109B2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000236083A (ja) * 1999-02-15 2000-08-29 Nippon Inter Electronics Corp 半導体装置及びその製造方法
US10355175B2 (en) 2016-03-10 2019-07-16 Panasonic Intellectual Property Management Co., Ltd. Light emitting device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000236083A (ja) * 1999-02-15 2000-08-29 Nippon Inter Electronics Corp 半導体装置及びその製造方法
US10355175B2 (en) 2016-03-10 2019-07-16 Panasonic Intellectual Property Management Co., Ltd. Light emitting device

Also Published As

Publication number Publication date
JPS6031109B2 (ja) 1985-07-20

Similar Documents

Publication Publication Date Title
JPS5687340A (en) Semiconductor device and manufacture thereof
JPS5669855A (en) Semiconductor device and its manufacture
JPS5310982A (en) Production of mis semiconductor device
JPS5726467A (en) Manufacture of semiconductor device
JPS52109369A (en) Manufacture of semiconductor device
JPS531471A (en) Manufacture for semiconductor device
JPS538073A (en) Mis type semiconductor device
JPS52104881A (en) Manufacture for semiconductor device
JPS5372473A (en) Manufacture of mis type semicondctor device
JPS5372470A (en) Semiconductor device
JPS5240977A (en) Process for production of semiconductor device
JPS534476A (en) Mask alignment method to semiconductor substrate
JPS52129276A (en) Production of semiconductor device
JPS53979A (en) Preparation of semiconductor device
JPS5317286A (en) Production of semiconductor device
JPS5329662A (en) Production of semiconductor device
JPS52129288A (en) Production of semiconductor integrated citrcuit
JPS54104785A (en) P-wel and its forming method
JPS5377168A (en) Production of semiconductor device
JPS543470A (en) Etching method
JPS5287373A (en) Production of semiconductor device
JPS5633826A (en) Manufacture of target
JPS53120264A (en) Manufacture of semiconductor device
JPS547867A (en) Manufacture for semiconductor device
JPS5429587A (en) Semiconductor device