JPS5664441A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5664441A JPS5664441A JP14071879A JP14071879A JPS5664441A JP S5664441 A JPS5664441 A JP S5664441A JP 14071879 A JP14071879 A JP 14071879A JP 14071879 A JP14071879 A JP 14071879A JP S5664441 A JPS5664441 A JP S5664441A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- magnet
- plasma
- cvd film
- quartz tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14071879A JPS5664441A (en) | 1979-10-30 | 1979-10-30 | Manufacture of semiconductor device |
US06/201,115 US4487161A (en) | 1979-10-30 | 1980-10-28 | Semiconductor device manufacturing unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14071879A JPS5664441A (en) | 1979-10-30 | 1979-10-30 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5664441A true JPS5664441A (en) | 1981-06-01 |
JPS6148773B2 JPS6148773B2 (ja) | 1986-10-25 |
Family
ID=15275088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14071879A Granted JPS5664441A (en) | 1979-10-30 | 1979-10-30 | Manufacture of semiconductor device |
Country Status (2)
Country | Link |
---|---|
US (1) | US4487161A (ja) |
JP (1) | JPS5664441A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6058617A (ja) * | 1983-09-12 | 1985-04-04 | Seiko Epson Corp | プラズマ処理装置 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4751895A (en) * | 1985-09-03 | 1988-06-21 | Yates Cleon R | Door closure apparatus for encapsulating a wafer paddle |
JPS62166624U (ja) * | 1986-04-14 | 1987-10-22 | ||
US4733631B1 (en) * | 1986-09-30 | 1993-03-09 | Apparatus for coating substrate devices | |
JPS6453544A (en) * | 1987-08-25 | 1989-03-01 | Mitsubishi Electric Corp | Semiconductor manufacturing apparatus |
US4946714A (en) * | 1987-08-25 | 1990-08-07 | Mitsubishi Denki Kabushiki Kaisha | Method for producing semiconductor devices |
US5093557A (en) * | 1989-05-16 | 1992-03-03 | Microscience, Inc. | Substrate heater and heating element |
JP3106172B2 (ja) * | 1991-02-26 | 2000-11-06 | 東京エレクトロン株式会社 | 熱処理装置の封止構造 |
KR950006969B1 (ko) * | 1992-01-06 | 1995-06-26 | 삼성전자주식회사 | 반도체 제조용 튜브장치 |
US5478608A (en) * | 1994-11-14 | 1995-12-26 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating method and apparatus |
US5587207A (en) * | 1994-11-14 | 1996-12-24 | Gorokhovsky; Vladimir I. | Arc assisted CVD coating and sintering method |
US5582649A (en) * | 1996-02-29 | 1996-12-10 | The United States Of America As Represented By The Secretary Of The Air Force | Wafer transfer apparatus for use in a film deposition furnace |
US6112695A (en) | 1996-10-08 | 2000-09-05 | Nano Scale Surface Systems, Inc. | Apparatus for plasma deposition of a thin film onto the interior surface of a container |
US6303908B1 (en) * | 1999-08-26 | 2001-10-16 | Nichiyo Engineering Corporation | Heat treatment apparatus |
KR100402395B1 (ko) * | 2000-12-05 | 2003-10-22 | 준 신 이 | 중공의 음극과 플라즈마를 이용한 태양전지 양산용 실리콘질화막의 제조장치 |
US20060226940A1 (en) * | 2005-04-07 | 2006-10-12 | Hitachi Global Storage Technologies | Method and apparatus for setting a sensor AFM with a superconducting magnet |
US20100183818A1 (en) * | 2006-09-06 | 2010-07-22 | Seoul National University Industry Foundation | Apparatus and method of depositing films using bias and charging behavior of nanoparticles formed during chemical vapor deposition |
CN101603169B (zh) * | 2008-06-11 | 2012-01-25 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置 |
US11133207B2 (en) * | 2018-08-30 | 2021-09-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming films on wafers separated by different distances |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5483376A (en) * | 1977-12-16 | 1979-07-03 | Fujitsu Ltd | Plasma treatment equipment |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3297465A (en) * | 1963-12-31 | 1967-01-10 | Ibm | Method for producing organic plasma and for depositing polymer films |
GB1104935A (en) * | 1964-05-08 | 1968-03-06 | Standard Telephones Cables Ltd | Improvements in or relating to a method of forming a layer of an inorganic compound |
US3916034A (en) * | 1971-05-21 | 1975-10-28 | Hitachi Ltd | Method of transporting substances in a plasma stream to and depositing it on a target |
GB1342544A (en) * | 1971-10-28 | 1974-01-03 | Standard Telephones Cables Ltd | Method of forming glass layers |
US3875068A (en) * | 1973-02-20 | 1975-04-01 | Tegal Corp | Gaseous plasma reaction apparatus |
US4129090A (en) * | 1973-02-28 | 1978-12-12 | Hitachi, Ltd. | Apparatus for diffusion into semiconductor wafers |
DE2344581A1 (de) * | 1973-09-04 | 1975-04-17 | Siemens Ag | Verfahren und vorrichtung zum reaktiven aufdampfen duenner schichten |
JPS53112066A (en) * | 1977-03-11 | 1978-09-30 | Fujitsu Ltd | Plasma treatment apparatus |
US4223048A (en) * | 1978-08-07 | 1980-09-16 | Pacific Western Systems | Plasma enhanced chemical vapor processing of semiconductive wafers |
-
1979
- 1979-10-30 JP JP14071879A patent/JPS5664441A/ja active Granted
-
1980
- 1980-10-28 US US06/201,115 patent/US4487161A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5483376A (en) * | 1977-12-16 | 1979-07-03 | Fujitsu Ltd | Plasma treatment equipment |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6058617A (ja) * | 1983-09-12 | 1985-04-04 | Seiko Epson Corp | プラズマ処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6148773B2 (ja) | 1986-10-25 |
US4487161A (en) | 1984-12-11 |
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