JPS5659237A - Preparation of photosensitive resin film - Google Patents

Preparation of photosensitive resin film

Info

Publication number
JPS5659237A
JPS5659237A JP13559979A JP13559979A JPS5659237A JP S5659237 A JPS5659237 A JP S5659237A JP 13559979 A JP13559979 A JP 13559979A JP 13559979 A JP13559979 A JP 13559979A JP S5659237 A JPS5659237 A JP S5659237A
Authority
JP
Japan
Prior art keywords
photosensitive resin
resin film
resin
semiconductor substrate
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13559979A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159575B2 (enrdf_load_stackoverflow
Inventor
Masaru Sasako
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13559979A priority Critical patent/JPS5659237A/ja
Publication of JPS5659237A publication Critical patent/JPS5659237A/ja
Publication of JPH0159575B2 publication Critical patent/JPH0159575B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13559979A 1979-10-19 1979-10-19 Preparation of photosensitive resin film Granted JPS5659237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13559979A JPS5659237A (en) 1979-10-19 1979-10-19 Preparation of photosensitive resin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13559979A JPS5659237A (en) 1979-10-19 1979-10-19 Preparation of photosensitive resin film

Publications (2)

Publication Number Publication Date
JPS5659237A true JPS5659237A (en) 1981-05-22
JPH0159575B2 JPH0159575B2 (enrdf_load_stackoverflow) 1989-12-18

Family

ID=15155579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13559979A Granted JPS5659237A (en) 1979-10-19 1979-10-19 Preparation of photosensitive resin film

Country Status (1)

Country Link
JP (1) JPS5659237A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0159575B2 (enrdf_load_stackoverflow) 1989-12-18

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