JPH0159575B2 - - Google Patents
Info
- Publication number
- JPH0159575B2 JPH0159575B2 JP13559979A JP13559979A JPH0159575B2 JP H0159575 B2 JPH0159575 B2 JP H0159575B2 JP 13559979 A JP13559979 A JP 13559979A JP 13559979 A JP13559979 A JP 13559979A JP H0159575 B2 JPH0159575 B2 JP H0159575B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- coating
- semiconductor substrate
- pattern
- spinner
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011347 resin Substances 0.000 claims description 43
- 229920005989 resin Polymers 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 20
- 239000004065 semiconductor Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 239000012298 atmosphere Substances 0.000 claims description 9
- 239000003960 organic solvent Substances 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 238000007796 conventional method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- 230000007547 defect Effects 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13559979A JPS5659237A (en) | 1979-10-19 | 1979-10-19 | Preparation of photosensitive resin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13559979A JPS5659237A (en) | 1979-10-19 | 1979-10-19 | Preparation of photosensitive resin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5659237A JPS5659237A (en) | 1981-05-22 |
| JPH0159575B2 true JPH0159575B2 (enrdf_load_stackoverflow) | 1989-12-18 |
Family
ID=15155579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13559979A Granted JPS5659237A (en) | 1979-10-19 | 1979-10-19 | Preparation of photosensitive resin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5659237A (enrdf_load_stackoverflow) |
-
1979
- 1979-10-19 JP JP13559979A patent/JPS5659237A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5659237A (en) | 1981-05-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2994501B2 (ja) | パターン形成方法 | |
| JPH0159575B2 (enrdf_load_stackoverflow) | ||
| JP3348842B2 (ja) | 回転塗布膜の形成方法 | |
| JPS63185028A (ja) | 半導体装置の製造方法 | |
| JPS6191655A (ja) | ホトレジストの塗布方法 | |
| JPS61184824A (ja) | レジスト塗布方法およびレジスト塗布装置 | |
| JPH04104158A (ja) | フォトレジスト膜形成方法 | |
| JPS6362323A (ja) | 半導体装置の製造方法 | |
| JP3439488B2 (ja) | 半導体装置の製造方法 | |
| JP2586383B2 (ja) | 反射および干渉防止樹脂膜の形成方法 | |
| JP2541385B2 (ja) | 略密閉型スピンナとスピンコ―ト方法 | |
| JP2544478B2 (ja) | ウエットエッチング方法 | |
| JPH07235479A (ja) | 半導体素子の製造方法 | |
| KR0156106B1 (ko) | 금속배선 공정에서의 패턴 형성방법 | |
| KR0144420B1 (ko) | 리소그라피 공정방법 | |
| KR930006133B1 (ko) | 모스소자의 콘택트홀 형성방법 | |
| TW311237B (en) | Photoresist coating method | |
| JPS5852639A (ja) | レジストパタ−ン形成方法 | |
| JP2875556B2 (ja) | 半導体素子の製造方法 | |
| KR100441708B1 (ko) | 포토리소그래피 공정에서의 현상방법 | |
| JPS6074621A (ja) | 半導体装置の製造方法 | |
| JPH0269934A (ja) | 半導体装置の製造方法 | |
| JPH03227513A (ja) | ホトレジスト膜の形成方法 | |
| JPH03194925A (ja) | 半導体装置の製造方法 | |
| JPS6153726A (ja) | パタ−ン形成法 |