JPS565761B2 - - Google Patents

Info

Publication number
JPS565761B2
JPS565761B2 JP9680378A JP9680378A JPS565761B2 JP S565761 B2 JPS565761 B2 JP S565761B2 JP 9680378 A JP9680378 A JP 9680378A JP 9680378 A JP9680378 A JP 9680378A JP S565761 B2 JPS565761 B2 JP S565761B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9680378A
Other languages
Japanese (ja)
Other versions
JPS5523163A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9680378A priority Critical patent/JPS5523163A/ja
Priority to US06/062,490 priority patent/US4272620A/en
Priority to GB7927178A priority patent/GB2030575B/en
Priority to DE2932376A priority patent/DE2932376C2/de
Publication of JPS5523163A publication Critical patent/JPS5523163A/ja
Publication of JPS565761B2 publication Critical patent/JPS565761B2/ja
Granted legal-status Critical Current

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Landscapes

  • Pyridine Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
JP9680378A 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation Granted JPS5523163A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation
US06/062,490 US4272620A (en) 1978-08-09 1979-07-31 Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
GB7927178A GB2030575B (en) 1978-08-09 1979-08-03 Photosensitive resin and method for manufacture thereof
DE2932376A DE2932376C2 (de) 1978-08-09 1979-08-09 Lichtempfindliche Polyvinylalkoholderivate, Verfahren zu ihrer Herstellung und ihre Verwendung im Siebdruck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Publications (2)

Publication Number Publication Date
JPS5523163A JPS5523163A (en) 1980-02-19
JPS565761B2 true JPS565761B2 (de) 1981-02-06

Family

ID=14174768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9680378A Granted JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Country Status (1)

Country Link
JP (1) JPS5523163A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5830035B2 (ja) * 1980-03-31 1983-06-27 工業技術院長 固定化酵素の製造方法
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS59102232A (ja) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol スクリーン印刷版製造用感光性材料
JPS6287394A (ja) * 1985-10-14 1987-04-21 Shin Etsu Chem Co Ltd スクリ−ン印刷用メツシユ複合材料
JPS62129107A (ja) * 1985-11-29 1987-06-11 Agency Of Ind Science & Technol 水と水溶性有機溶媒との分離方法
JPH0713099B2 (ja) 1988-12-14 1995-02-15 工業技術院長 感光性ポリビニルアルコール誘導体
DE19639897A1 (de) * 1996-09-27 1998-04-02 Sun Chemical Corp Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
JPH10301272A (ja) * 1997-04-30 1998-11-13 Toyo Gosei Kogyo Kk 感光性組成物及びパターン形成方法
KR100477984B1 (ko) * 1997-08-30 2005-12-30 삼성에스디아이 주식회사 포토레지스트용 감광성 고분자 및 이의 제조방법
JP3870385B2 (ja) * 1997-10-20 2007-01-17 冨士薬品工業株式会社 水溶性フォトレジスト組成物
JP3771705B2 (ja) 1998-03-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトレジストインク
JP3771714B2 (ja) 1998-05-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
JP2005202066A (ja) * 2004-01-14 2005-07-28 Fuji Photo Film Co Ltd 感光性転写シート、感光性積層体、画像パターンを形成する方法、配線パターンを形成する方法
JP6545506B2 (ja) * 2015-03-31 2019-07-17 株式会社Adeka 重合体及び光硬化性組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone
EP0220121A3 (de) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Also Published As

Publication number Publication date
JPS5523163A (en) 1980-02-19

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