JPS565765B2 - - Google Patents

Info

Publication number
JPS565765B2
JPS565765B2 JP2251378A JP2251378A JPS565765B2 JP S565765 B2 JPS565765 B2 JP S565765B2 JP 2251378 A JP2251378 A JP 2251378A JP 2251378 A JP2251378 A JP 2251378A JP S565765 B2 JPS565765 B2 JP S565765B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2251378A
Other languages
Japanese (ja)
Other versions
JPS54114594A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2251378A priority Critical patent/JPS54114594A/ja
Publication of JPS54114594A publication Critical patent/JPS54114594A/ja
Publication of JPS565765B2 publication Critical patent/JPS565765B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
JP2251378A 1978-02-28 1978-02-28 Soluble photosensitive resin and its preparation Granted JPS54114594A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2251378A JPS54114594A (en) 1978-02-28 1978-02-28 Soluble photosensitive resin and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2251378A JPS54114594A (en) 1978-02-28 1978-02-28 Soluble photosensitive resin and its preparation

Publications (2)

Publication Number Publication Date
JPS54114594A JPS54114594A (en) 1979-09-06
JPS565765B2 true JPS565765B2 (de) 1981-02-06

Family

ID=12084834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2251378A Granted JPS54114594A (en) 1978-02-28 1978-02-28 Soluble photosensitive resin and its preparation

Country Status (1)

Country Link
JP (1) JPS54114594A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1161826B (it) * 1983-05-03 1987-03-18 Anic Spa Metodo per la terminazione di polimeri viventi e composti adatti allo scopo
JP2734505B2 (ja) * 1985-06-11 1998-03-30 大日本インキ化学工業株式会社 感熱記録体
JP2630483B2 (ja) * 1990-03-19 1997-07-16 富士写真フイルム株式会社 新規電子伝導性高分子及びそれを用いた導電性材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone
EP0220121A3 (de) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Also Published As

Publication number Publication date
JPS54114594A (en) 1979-09-06

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