JPS565762B2 - - Google Patents

Info

Publication number
JPS565762B2
JPS565762B2 JP13653678A JP13653678A JPS565762B2 JP S565762 B2 JPS565762 B2 JP S565762B2 JP 13653678 A JP13653678 A JP 13653678A JP 13653678 A JP13653678 A JP 13653678A JP S565762 B2 JPS565762 B2 JP S565762B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13653678A
Other languages
Japanese (ja)
Other versions
JPS5562905A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13653678A priority Critical patent/JPS5562905A/ja
Priority to US06/062,490 priority patent/US4272620A/en
Priority to GB7927178A priority patent/GB2030575B/en
Priority to DE2932376A priority patent/DE2932376C2/de
Publication of JPS5562905A publication Critical patent/JPS5562905A/ja
Publication of JPS565762B2 publication Critical patent/JPS565762B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
JP13653678A 1978-08-09 1978-11-06 Photo-insolubilized resin and its preparation Granted JPS5562905A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13653678A JPS5562905A (en) 1978-11-06 1978-11-06 Photo-insolubilized resin and its preparation
US06/062,490 US4272620A (en) 1978-08-09 1979-07-31 Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
GB7927178A GB2030575B (en) 1978-08-09 1979-08-03 Photosensitive resin and method for manufacture thereof
DE2932376A DE2932376C2 (de) 1978-08-09 1979-08-09 Lichtempfindliche Polyvinylalkoholderivate, Verfahren zu ihrer Herstellung und ihre Verwendung im Siebdruck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13653678A JPS5562905A (en) 1978-11-06 1978-11-06 Photo-insolubilized resin and its preparation

Publications (2)

Publication Number Publication Date
JPS5562905A JPS5562905A (en) 1980-05-12
JPS565762B2 true JPS565762B2 (de) 1981-02-06

Family

ID=15177474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13653678A Granted JPS5562905A (en) 1978-08-09 1978-11-06 Photo-insolubilized resin and its preparation

Country Status (1)

Country Link
JP (1) JPS5562905A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPH10301272A (ja) * 1997-04-30 1998-11-13 Toyo Gosei Kogyo Kk 感光性組成物及びパターン形成方法
JP3771705B2 (ja) 1998-03-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトレジストインク
JP3771714B2 (ja) 1998-05-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
US6444391B2 (en) 1998-09-24 2002-09-03 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
EP1058154A1 (de) * 1999-06-04 2000-12-06 Toyo Gosei Kogyo Co., Ltd. Lichtempfindliches verseiftes Polyvinylacetat enthaltende Zusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법
JP4890541B2 (ja) 2006-05-17 2012-03-07 株式会社ムラカミ 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
JP6545506B2 (ja) * 2015-03-31 2019-07-17 株式会社Adeka 重合体及び光硬化性組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A2 (de) * 1985-10-14 1987-04-29 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone
EP0220121A3 (de) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Also Published As

Publication number Publication date
JPS5562905A (en) 1980-05-12

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