JPS5562905A - Photo-insolubilized resin and its preparation - Google Patents

Photo-insolubilized resin and its preparation

Info

Publication number
JPS5562905A
JPS5562905A JP13653678A JP13653678A JPS5562905A JP S5562905 A JPS5562905 A JP S5562905A JP 13653678 A JP13653678 A JP 13653678A JP 13653678 A JP13653678 A JP 13653678A JP S5562905 A JPS5562905 A JP S5562905A
Authority
JP
Japan
Prior art keywords
alkyl
units
polyvinyl alcohol
formula
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13653678A
Other languages
English (en)
Other versions
JPS565762B2 (ja
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP13653678A priority Critical patent/JPS5562905A/ja
Priority to US06/062,490 priority patent/US4272620A/en
Priority to GB7927178A priority patent/GB2030575B/en
Priority to DE2932376A priority patent/DE2932376C2/de
Publication of JPS5562905A publication Critical patent/JPS5562905A/ja
Publication of JPS565762B2 publication Critical patent/JPS565762B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
JP13653678A 1978-08-09 1978-11-06 Photo-insolubilized resin and its preparation Granted JPS5562905A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13653678A JPS5562905A (en) 1978-11-06 1978-11-06 Photo-insolubilized resin and its preparation
US06/062,490 US4272620A (en) 1978-08-09 1979-07-31 Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
GB7927178A GB2030575B (en) 1978-08-09 1979-08-03 Photosensitive resin and method for manufacture thereof
DE2932376A DE2932376C2 (de) 1978-08-09 1979-08-09 Lichtempfindliche Polyvinylalkoholderivate, Verfahren zu ihrer Herstellung und ihre Verwendung im Siebdruck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13653678A JPS5562905A (en) 1978-11-06 1978-11-06 Photo-insolubilized resin and its preparation

Publications (2)

Publication Number Publication Date
JPS5562905A true JPS5562905A (en) 1980-05-12
JPS565762B2 JPS565762B2 (ja) 1981-02-06

Family

ID=15177474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13653678A Granted JPS5562905A (en) 1978-08-09 1978-11-06 Photo-insolubilized resin and its preparation

Country Status (1)

Country Link
JP (1) JPS5562905A (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2483638A1 (fr) * 1980-04-17 1981-12-04 Agency Ind Science Techn Matieres resineuses photosensibles
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A3 (en) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. A method for the preparation of a screen mesh for screen printing

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2483638A1 (fr) * 1980-04-17 1981-12-04 Agency Ind Science Techn Matieres resineuses photosensibles
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6475702B2 (en) 1998-03-12 2002-11-05 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6322952B1 (en) 1998-03-12 2001-11-27 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
KR20010007228A (ko) * 1999-06-04 2001-01-26 도요 고세이 고교 가부시키가이샤 감광성 비누화된 폴리(비닐 아세테이트)로 구성된 감광성조성물 및 그 조성물을 이용하는 패턴형성방법
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
US7767381B2 (en) 2006-05-17 2010-08-03 Murakami Co., Ltd. Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Also Published As

Publication number Publication date
JPS565762B2 (ja) 1981-02-06

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