JPS565764B2 - - Google Patents
Info
- Publication number
- JPS565764B2 JPS565764B2 JP2251278A JP2251278A JPS565764B2 JP S565764 B2 JPS565764 B2 JP S565764B2 JP 2251278 A JP2251278 A JP 2251278A JP 2251278 A JP2251278 A JP 2251278A JP S565764 B2 JPS565764 B2 JP S565764B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2251278A JPS54114593A (en) | 1978-02-28 | 1978-02-28 | New photosensitive polymeric compound and its preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2251278A JPS54114593A (en) | 1978-02-28 | 1978-02-28 | New photosensitive polymeric compound and its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54114593A JPS54114593A (en) | 1979-09-06 |
| JPS565764B2 true JPS565764B2 (de) | 1981-02-06 |
Family
ID=12084805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2251278A Granted JPS54114593A (en) | 1978-02-28 | 1978-02-28 | New photosensitive polymeric compound and its preparation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54114593A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0220121A2 (de) * | 1985-10-14 | 1987-04-29 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung einer Siebdruckschablone |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2630483B2 (ja) * | 1990-03-19 | 1997-07-16 | 富士写真フイルム株式会社 | 新規電子伝導性高分子及びそれを用いた導電性材料 |
| JP5181276B2 (ja) * | 2008-02-29 | 2013-04-10 | 国立大学法人大阪大学 | ポリエチルビニルエーテル誘導体、その製造方法、及びｌｃｓｔ型相分離の制御方法 |
-
1978
- 1978-02-28 JP JP2251278A patent/JPS54114593A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0220121A2 (de) * | 1985-10-14 | 1987-04-29 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung einer Siebdruckschablone |
| EP0220121A3 (de) * | 1985-10-14 | 1987-07-01 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung einer Siebdruckschablone |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54114593A (en) | 1979-09-06 |