JPS5657038A - Photomask for integrated circuit - Google Patents

Photomask for integrated circuit

Info

Publication number
JPS5657038A
JPS5657038A JP13461079A JP13461079A JPS5657038A JP S5657038 A JPS5657038 A JP S5657038A JP 13461079 A JP13461079 A JP 13461079A JP 13461079 A JP13461079 A JP 13461079A JP S5657038 A JPS5657038 A JP S5657038A
Authority
JP
Japan
Prior art keywords
pattern
photomask
integrated circuit
circuit
chip forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13461079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6148708B2 (enrdf_load_stackoverflow
Inventor
Masaru Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13461079A priority Critical patent/JPS5657038A/ja
Publication of JPS5657038A publication Critical patent/JPS5657038A/ja
Publication of JPS6148708B2 publication Critical patent/JPS6148708B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP13461079A 1979-10-15 1979-10-15 Photomask for integrated circuit Granted JPS5657038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13461079A JPS5657038A (en) 1979-10-15 1979-10-15 Photomask for integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13461079A JPS5657038A (en) 1979-10-15 1979-10-15 Photomask for integrated circuit

Publications (2)

Publication Number Publication Date
JPS5657038A true JPS5657038A (en) 1981-05-19
JPS6148708B2 JPS6148708B2 (enrdf_load_stackoverflow) 1986-10-25

Family

ID=15132414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13461079A Granted JPS5657038A (en) 1979-10-15 1979-10-15 Photomask for integrated circuit

Country Status (1)

Country Link
JP (1) JPS5657038A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02307266A (ja) * 1989-05-23 1990-12-20 Seiko Epson Corp 半導体集積回路装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01119614U (enrdf_load_stackoverflow) * 1988-02-02 1989-08-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02307266A (ja) * 1989-05-23 1990-12-20 Seiko Epson Corp 半導体集積回路装置

Also Published As

Publication number Publication date
JPS6148708B2 (enrdf_load_stackoverflow) 1986-10-25

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