JPS54101274A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS54101274A JPS54101274A JP720878A JP720878A JPS54101274A JP S54101274 A JPS54101274 A JP S54101274A JP 720878 A JP720878 A JP 720878A JP 720878 A JP720878 A JP 720878A JP S54101274 A JPS54101274 A JP S54101274A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- photo resist
- side etching
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To avoid the side etching caused to the metal wiring crossing with the step, in the manufacture of semiconductor device.
CONSTITUTION: The occurrence of side etching at the step part can be avoided by providing the dummy pattern 6a in which the width of the photo resist 6 in the step parts A and B is greater than that of the photo resist at other flat parts.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP720878A JPS54101274A (en) | 1978-01-27 | 1978-01-27 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP720878A JPS54101274A (en) | 1978-01-27 | 1978-01-27 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54101274A true JPS54101274A (en) | 1979-08-09 |
Family
ID=11659581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP720878A Pending JPS54101274A (en) | 1978-01-27 | 1978-01-27 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54101274A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5710250A (en) * | 1980-06-23 | 1982-01-19 | Seiko Epson Corp | Semiconductor device |
JPS58110040A (en) * | 1981-12-23 | 1983-06-30 | Fujitsu Ltd | Pattern formation |
JPS58115823A (en) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | Design of photo mask pattern |
JPS58115822A (en) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | Drawing on electron beam resist |
JPS63220249A (en) * | 1987-03-10 | 1988-09-13 | Japan Radio Co Ltd | Method for forming circuit pattern on curved surface |
JPS6461753A (en) * | 1987-09-01 | 1989-03-08 | Nec Corp | Shape data correcting method for optical mask |
US7402926B2 (en) | 2002-11-08 | 2008-07-22 | Asmo Co., Ltd | Actuator device |
-
1978
- 1978-01-27 JP JP720878A patent/JPS54101274A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5710250A (en) * | 1980-06-23 | 1982-01-19 | Seiko Epson Corp | Semiconductor device |
JPS58110040A (en) * | 1981-12-23 | 1983-06-30 | Fujitsu Ltd | Pattern formation |
JPH0365011B2 (en) * | 1981-12-23 | 1991-10-09 | ||
JPS58115823A (en) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | Design of photo mask pattern |
JPS58115822A (en) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | Drawing on electron beam resist |
JPH0542805B2 (en) * | 1981-12-28 | 1993-06-29 | Fujitsu Ltd | |
JPS63220249A (en) * | 1987-03-10 | 1988-09-13 | Japan Radio Co Ltd | Method for forming circuit pattern on curved surface |
JPS6461753A (en) * | 1987-09-01 | 1989-03-08 | Nec Corp | Shape data correcting method for optical mask |
US7402926B2 (en) | 2002-11-08 | 2008-07-22 | Asmo Co., Ltd | Actuator device |
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