JPS54101274A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS54101274A
JPS54101274A JP720878A JP720878A JPS54101274A JP S54101274 A JPS54101274 A JP S54101274A JP 720878 A JP720878 A JP 720878A JP 720878 A JP720878 A JP 720878A JP S54101274 A JPS54101274 A JP S54101274A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
photo resist
side etching
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP720878A
Other languages
Japanese (ja)
Inventor
Shigeru Takahashi
Kiyoshi Tsukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP720878A priority Critical patent/JPS54101274A/en
Publication of JPS54101274A publication Critical patent/JPS54101274A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To avoid the side etching caused to the metal wiring crossing with the step, in the manufacture of semiconductor device.
CONSTITUTION: The occurrence of side etching at the step part can be avoided by providing the dummy pattern 6a in which the width of the photo resist 6 in the step parts A and B is greater than that of the photo resist at other flat parts.
COPYRIGHT: (C)1979,JPO&Japio
JP720878A 1978-01-27 1978-01-27 Manufacture for semiconductor device Pending JPS54101274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP720878A JPS54101274A (en) 1978-01-27 1978-01-27 Manufacture for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720878A JPS54101274A (en) 1978-01-27 1978-01-27 Manufacture for semiconductor device

Publications (1)

Publication Number Publication Date
JPS54101274A true JPS54101274A (en) 1979-08-09

Family

ID=11659581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP720878A Pending JPS54101274A (en) 1978-01-27 1978-01-27 Manufacture for semiconductor device

Country Status (1)

Country Link
JP (1) JPS54101274A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710250A (en) * 1980-06-23 1982-01-19 Seiko Epson Corp Semiconductor device
JPS58110040A (en) * 1981-12-23 1983-06-30 Fujitsu Ltd Pattern formation
JPS58115823A (en) * 1981-12-28 1983-07-09 Fujitsu Ltd Design of photo mask pattern
JPS58115822A (en) * 1981-12-28 1983-07-09 Fujitsu Ltd Drawing on electron beam resist
JPS63220249A (en) * 1987-03-10 1988-09-13 Japan Radio Co Ltd Method for forming circuit pattern on curved surface
JPS6461753A (en) * 1987-09-01 1989-03-08 Nec Corp Shape data correcting method for optical mask
US7402926B2 (en) 2002-11-08 2008-07-22 Asmo Co., Ltd Actuator device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710250A (en) * 1980-06-23 1982-01-19 Seiko Epson Corp Semiconductor device
JPS58110040A (en) * 1981-12-23 1983-06-30 Fujitsu Ltd Pattern formation
JPH0365011B2 (en) * 1981-12-23 1991-10-09
JPS58115823A (en) * 1981-12-28 1983-07-09 Fujitsu Ltd Design of photo mask pattern
JPS58115822A (en) * 1981-12-28 1983-07-09 Fujitsu Ltd Drawing on electron beam resist
JPH0542805B2 (en) * 1981-12-28 1993-06-29 Fujitsu Ltd
JPS63220249A (en) * 1987-03-10 1988-09-13 Japan Radio Co Ltd Method for forming circuit pattern on curved surface
JPS6461753A (en) * 1987-09-01 1989-03-08 Nec Corp Shape data correcting method for optical mask
US7402926B2 (en) 2002-11-08 2008-07-22 Asmo Co., Ltd Actuator device

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