JPS5648131A - Ion implantation machine - Google Patents
Ion implantation machineInfo
- Publication number
- JPS5648131A JPS5648131A JP12441579A JP12441579A JPS5648131A JP S5648131 A JPS5648131 A JP S5648131A JP 12441579 A JP12441579 A JP 12441579A JP 12441579 A JP12441579 A JP 12441579A JP S5648131 A JPS5648131 A JP S5648131A
- Authority
- JP
- Japan
- Prior art keywords
- discs
- beams
- toothed wheel
- ion
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 title abstract 2
- 150000002500 ions Chemical class 0.000 abstract 4
- 235000012431 wafers Nutrition 0.000 abstract 4
- 238000010884 ion-beam technique Methods 0.000 abstract 2
- 239000007943 implant Substances 0.000 abstract 1
- 238000002513 implantation Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
Landscapes
- Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Abstract
PURPOSE:To implant ions with high-accuracy in a predetermined position through one side of the holes of discs by arranging plural discs at the position overlapping with ion beams. CONSTITUTION:Mass separation is done for ion beams 4 by an electromanget 3. Specific ion species 4' only pass through a gap 6 and the specific ion species scan all the surfaces of wafers 7a by driving 28 the gap 6 for movement. Fine variations in an implantation angle are revised and deflected by an electromagnet 26. A flat toothed wheel 32 is provided at the tip of a pulse motor 30a shaft to rotate a toothed wheel 29 running on the external circumference of a pulse motor 30b shaft and discs 9a are rotated through a fitting plate 33a installed on the toothed wheel 29. Predetermined amounts of ions are implanted in the surfaces of plural wafers 7a by rotating the discs 9a at a constant speed and by scanning the beams 4 in a radius direction. Each disc 9a has a bigger hole than each wafer on the same circumference with each wafer to stop the hole at the passing position of the beams 4. In this composition, ion implantation will be performed with high-accuracy and productivity will be increased.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12441579A JPS5648131A (en) | 1979-09-27 | 1979-09-27 | Ion implantation machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12441579A JPS5648131A (en) | 1979-09-27 | 1979-09-27 | Ion implantation machine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5648131A true JPS5648131A (en) | 1981-05-01 |
Family
ID=14884903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12441579A Pending JPS5648131A (en) | 1979-09-27 | 1979-09-27 | Ion implantation machine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5648131A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970052144A (en) * | 1995-12-26 | 1997-07-29 | 김주용 | Helical beam ion implanter |
-
1979
- 1979-09-27 JP JP12441579A patent/JPS5648131A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970052144A (en) * | 1995-12-26 | 1997-07-29 | 김주용 | Helical beam ion implanter |
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