JPS6482443A - Focused ion beam implanting apparatus - Google Patents
Focused ion beam implanting apparatusInfo
- Publication number
- JPS6482443A JPS6482443A JP24046587A JP24046587A JPS6482443A JP S6482443 A JPS6482443 A JP S6482443A JP 24046587 A JP24046587 A JP 24046587A JP 24046587 A JP24046587 A JP 24046587A JP S6482443 A JPS6482443 A JP S6482443A
- Authority
- JP
- Japan
- Prior art keywords
- rotated
- angle
- gear
- horizontal direction
- deflectors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To eliminate the channel effect and surely perform the ion implantation to a material by rotating obliquely illuminating deflectors in the horizontal direction and controlling the rotation angle. CONSTITUTION:A block 20 fixed with obliquely illuminating electrostatic type deflectors 13 and 14 can be rotated up to + or -90 deg. in the horizontal direction centering an axis 30. When a rotation control signal is fed to a motor 23 from an MPU 24 to rotate it by the quantity in response to the input signal, a gear 22 directly coupled with its rotary shaft is also rotated, and its rotating force is transferred to a gear 21 engaged with it. When the gear 21 is rotated, the block 20 is rotated in the horizontal direction by the preset angle in response to it, and as a result the deflectors 13 and 14 fixed on the inside of the block 20 are of course rotated by the same angle. This rotation angle can be set to an angle at which the collision probability of an ion beam Bi with atoms is the highest. Ions can be thereby implanted to a material while the channel effect is eliminated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24046587A JPH0616387B2 (en) | 1987-09-24 | 1987-09-24 | Focused ion beam implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24046587A JPH0616387B2 (en) | 1987-09-24 | 1987-09-24 | Focused ion beam implanter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6482443A true JPS6482443A (en) | 1989-03-28 |
| JPH0616387B2 JPH0616387B2 (en) | 1994-03-02 |
Family
ID=17059911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24046587A Expired - Lifetime JPH0616387B2 (en) | 1987-09-24 | 1987-09-24 | Focused ion beam implanter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0616387B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007111876A2 (en) * | 2006-03-22 | 2007-10-04 | Varian Semiconductor Equipment Associates, Inc. | Determining ion beam parallelism using refraction method |
| JP2008021504A (en) * | 2006-07-12 | 2008-01-31 | Fujitsu Ltd | Irradiation direction-variable ion irradiation device, and secondary ion mass spectrometer |
-
1987
- 1987-09-24 JP JP24046587A patent/JPH0616387B2/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007111876A2 (en) * | 2006-03-22 | 2007-10-04 | Varian Semiconductor Equipment Associates, Inc. | Determining ion beam parallelism using refraction method |
| WO2007111876A3 (en) * | 2006-03-22 | 2007-11-08 | Varian Semiconductor Equipment | Determining ion beam parallelism using refraction method |
| US7397049B2 (en) | 2006-03-22 | 2008-07-08 | Varian Semiconductor Equipment Associates, Inc. | Determining ion beam parallelism using refraction method |
| TWI404107B (en) * | 2006-03-22 | 2013-08-01 | Varian Semiconductor Equipment | Determining ion beam parallelism using refraction method |
| JP2008021504A (en) * | 2006-07-12 | 2008-01-31 | Fujitsu Ltd | Irradiation direction-variable ion irradiation device, and secondary ion mass spectrometer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0616387B2 (en) | 1994-03-02 |
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