JPS643948A - Variable-width slit for large-current ion beam - Google Patents
Variable-width slit for large-current ion beamInfo
- Publication number
- JPS643948A JPS643948A JP15781887A JP15781887A JPS643948A JP S643948 A JPS643948 A JP S643948A JP 15781887 A JP15781887 A JP 15781887A JP 15781887 A JP15781887 A JP 15781887A JP S643948 A JPS643948 A JP S643948A
- Authority
- JP
- Japan
- Prior art keywords
- outer tubes
- symmetrical
- slit
- ion beam
- closed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To make the beam acceptance symmetrical by rotating cylinders symmetrically and in opposite directions around rotary shafts off-centered to symmetrical positions to the middle line of the cylinders from two cylinder center axes arranged in parallel. CONSTITUTION:An accelerated ion beam 1 is squeezed to a fixed quantity by outer tubes 2a, 2b made of carbon. The outer tubes 2a, 2b have the radius (r) and are symmetrically fitted so that the rotation centers O1, O2 off-centered from cylinder center axes by the distance (a) are separated from the beam center axis Z by the distance (r+a). A slit is opened or closed by controlling a drive motor 8 with a control circuit 9, and the rotation is transmitted to outer tubes 3a, 3b concurrently serving as rotary shafts by a gear box 11 in opposite directions synchronously at the same rotation angle. If the outer tubes 2a, 2b are synchronously rotated in the arrow A direction, the slit is gradually closed, and it is fully closed when the outer tubes are rotated by 180 deg.. The beam acceptance can be thereby made symmetrical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15781887A JPS643948A (en) | 1987-06-26 | 1987-06-26 | Variable-width slit for large-current ion beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15781887A JPS643948A (en) | 1987-06-26 | 1987-06-26 | Variable-width slit for large-current ion beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS643948A true JPS643948A (en) | 1989-01-09 |
Family
ID=15657974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15781887A Pending JPS643948A (en) | 1987-06-26 | 1987-06-26 | Variable-width slit for large-current ion beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS643948A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0785567A3 (en) * | 1996-01-16 | 1998-07-29 | Varian Associates, Inc. | Charged particle beam slit assembly |
| KR100699121B1 (en) * | 2005-05-20 | 2007-03-22 | 동부일렉트로닉스 주식회사 | Ion beam extraction apparatus of ion implantation equipment |
| CN102446681A (en) * | 2010-10-13 | 2012-05-09 | 北京中科信电子装备有限公司 | Analytic diaphragm used for ion implantation machine |
| EP3483915A4 (en) * | 2017-06-22 | 2020-03-18 | Boe Technology Group Co. Ltd. | Ion implantation amount adjustment apparatus and method, ion implantation device, and determination method |
-
1987
- 1987-06-26 JP JP15781887A patent/JPS643948A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0785567A3 (en) * | 1996-01-16 | 1998-07-29 | Varian Associates, Inc. | Charged particle beam slit assembly |
| KR100483725B1 (en) * | 1996-01-16 | 2005-08-24 | 배리언 어소시에이츠 인코포레이티드 | Charged particle beam system with beam limiting slit formed by rotating cylinder |
| KR100699121B1 (en) * | 2005-05-20 | 2007-03-22 | 동부일렉트로닉스 주식회사 | Ion beam extraction apparatus of ion implantation equipment |
| CN102446681A (en) * | 2010-10-13 | 2012-05-09 | 北京中科信电子装备有限公司 | Analytic diaphragm used for ion implantation machine |
| EP3483915A4 (en) * | 2017-06-22 | 2020-03-18 | Boe Technology Group Co. Ltd. | Ion implantation amount adjustment apparatus and method, ion implantation device, and determination method |
| US10734189B2 (en) | 2017-06-22 | 2020-08-04 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Ion implantation amount adjustment device and method, ion implantation apparatus and determination method |
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