JPS57134933A - Electrically charged beam lithographer - Google Patents

Electrically charged beam lithographer

Info

Publication number
JPS57134933A
JPS57134933A JP2104981A JP2104981A JPS57134933A JP S57134933 A JPS57134933 A JP S57134933A JP 2104981 A JP2104981 A JP 2104981A JP 2104981 A JP2104981 A JP 2104981A JP S57134933 A JPS57134933 A JP S57134933A
Authority
JP
Japan
Prior art keywords
point
specimen
rotary disc
electron beam
electrically charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2104981A
Other languages
Japanese (ja)
Inventor
Shigeru Yasuami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2104981A priority Critical patent/JPS57134933A/en
Publication of JPS57134933A publication Critical patent/JPS57134933A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To produce patterns of concentric circles smoothly with high accuracy by providing a rotary table which rotates about and can move along axis of rotation in parallel with the emitting direction of electrically charged beams. CONSTITUTION:Where P1 is a point to which the rotating axis P of the rotary disc 1 is moved by a distance of r1 from an irradiating point E of an electron beam, a first circular pattern 4 of radius of r1 centered at the rotating axis P of the rotary disc 1 can be produced on a specimen 2 by means of the rotary disc 1 rotating sbout the point P1 as the electron beam irradiates the specimen 2. Next, the rotating axis P is moved to a next point P2 apart from the irradiating point E by a distance of r2 to rotate the rotary disc 1 and to irradiate the specimen with an electron beam again, whereby a second circular pattern 5 of r2 can be produced on the specimen 2. By repeating such procedure, desired cocentric circles can be formed successively.
JP2104981A 1981-02-16 1981-02-16 Electrically charged beam lithographer Pending JPS57134933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2104981A JPS57134933A (en) 1981-02-16 1981-02-16 Electrically charged beam lithographer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2104981A JPS57134933A (en) 1981-02-16 1981-02-16 Electrically charged beam lithographer

Publications (1)

Publication Number Publication Date
JPS57134933A true JPS57134933A (en) 1982-08-20

Family

ID=12044056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2104981A Pending JPS57134933A (en) 1981-02-16 1981-02-16 Electrically charged beam lithographer

Country Status (1)

Country Link
JP (1) JPS57134933A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119125A (en) * 1984-07-05 1986-01-28 Matsushita Electric Ind Co Ltd Scanning type exposer
JPS6355936A (en) * 1986-08-27 1988-03-10 Omron Tateisi Electronics Co Electron beam lithography device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6119125A (en) * 1984-07-05 1986-01-28 Matsushita Electric Ind Co Ltd Scanning type exposer
JPS6355936A (en) * 1986-08-27 1988-03-10 Omron Tateisi Electronics Co Electron beam lithography device

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