JPS561941A - Image forming method - Google Patents
Image forming methodInfo
- Publication number
- JPS561941A JPS561941A JP7782279A JP7782279A JPS561941A JP S561941 A JPS561941 A JP S561941A JP 7782279 A JP7782279 A JP 7782279A JP 7782279 A JP7782279 A JP 7782279A JP S561941 A JPS561941 A JP S561941A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer film
- image
- standing
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
- G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7782279A JPS561941A (en) | 1979-06-20 | 1979-06-20 | Image forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7782279A JPS561941A (en) | 1979-06-20 | 1979-06-20 | Image forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS561941A true JPS561941A (en) | 1981-01-10 |
Family
ID=13644723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7782279A Pending JPS561941A (en) | 1979-06-20 | 1979-06-20 | Image forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS561941A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57103317A (en) * | 1980-12-18 | 1982-06-26 | Fujitsu Ltd | Method for patterning |
JPS589141A (ja) * | 1981-07-10 | 1983-01-19 | Nippon Telegr & Teleph Corp <Ntt> | 放射線感応性ネガ形レジストの感度向上方法 |
-
1979
- 1979-06-20 JP JP7782279A patent/JPS561941A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57103317A (en) * | 1980-12-18 | 1982-06-26 | Fujitsu Ltd | Method for patterning |
JPS589141A (ja) * | 1981-07-10 | 1983-01-19 | Nippon Telegr & Teleph Corp <Ntt> | 放射線感応性ネガ形レジストの感度向上方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3486187D1 (de) | Verfahren und vorrichtung zur herstellung von schutzlackbildern. | |
ATE3336T1 (de) | Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen, danach hergestellte reliefstrukturen und deren verwendung. | |
SE7610739L (sv) | Forfarande for framstellning av plantryckformar medelst laserstralar | |
JPS5692536A (en) | Pattern formation method | |
JPS55148423A (en) | Method of pattern formation | |
DE3169802D1 (en) | Process for the production of highly heat-resistant relief structures, and their use | |
DE3062628D1 (en) | Method of producing relief structures resistant to a high temperature, relief structures produced thereby and their use | |
JPS561941A (en) | Image forming method | |
DE3785277D1 (de) | Verfahren zur herstellung waermebestaendiger strukturierter schichten. | |
DE3062826D1 (en) | Method of producing heat resistant relief structures, relief structures produced thereby and their use | |
JPH0653106A (ja) | 微細レジストパターンの形成方法 | |
JPS5443681A (en) | Electron beam light-exposing method | |
JPS5632143A (en) | Manufacture of photomask | |
JPS5679428A (en) | Working of ultra-fine article | |
JPS5652751A (en) | Photomask correcting method | |
JPS53147465A (en) | Forming method of patterns for lift-off | |
JPS5740929A (en) | Processing method of resist | |
JPS58140122A (ja) | 電子ビ−ム露光法 | |
JPS55113048A (en) | Image forming method | |
JPS5655943A (en) | Pattern forming method | |
JPS6281027A (ja) | 微細パタ−ン形成方法 | |
JPS5452473A (en) | Forming method for coating for fine pattern | |
SU938339A1 (ru) | Способ электронолитографии | |
JPS5594491A (en) | Forming method for thick minute metal pattern | |
JPS5712522A (en) | Forming method of pattern |