JPS56161655A - Multilayer aluminum wiring for semiconductor device - Google Patents
Multilayer aluminum wiring for semiconductor deviceInfo
- Publication number
- JPS56161655A JPS56161655A JP6411980A JP6411980A JPS56161655A JP S56161655 A JPS56161655 A JP S56161655A JP 6411980 A JP6411980 A JP 6411980A JP 6411980 A JP6411980 A JP 6411980A JP S56161655 A JPS56161655 A JP S56161655A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- aluminum
- film
- thin
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title abstract 6
- 229910052782 aluminium Inorganic materials 0.000 title abstract 6
- 239000004065 semiconductor Substances 0.000 title abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229920001721 polyimide Polymers 0.000 abstract 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 3
- 239000011521 glass Substances 0.000 abstract 3
- 229910052698 phosphorus Inorganic materials 0.000 abstract 3
- 239000011574 phosphorus Substances 0.000 abstract 3
- 239000009719 polyimide resin Substances 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 239000004642 Polyimide Substances 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6411980A JPS56161655A (en) | 1980-05-16 | 1980-05-16 | Multilayer aluminum wiring for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6411980A JPS56161655A (en) | 1980-05-16 | 1980-05-16 | Multilayer aluminum wiring for semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56161655A true JPS56161655A (en) | 1981-12-12 |
| JPS6346979B2 JPS6346979B2 (enrdf_load_stackoverflow) | 1988-09-20 |
Family
ID=13248851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6411980A Granted JPS56161655A (en) | 1980-05-16 | 1980-05-16 | Multilayer aluminum wiring for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56161655A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58197846A (ja) * | 1982-05-14 | 1983-11-17 | Oki Electric Ind Co Ltd | 多層配線構造体の製造方法 |
| JPS59117236A (ja) * | 1982-12-24 | 1984-07-06 | Hitachi Ltd | 半導体装置 |
-
1980
- 1980-05-16 JP JP6411980A patent/JPS56161655A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58197846A (ja) * | 1982-05-14 | 1983-11-17 | Oki Electric Ind Co Ltd | 多層配線構造体の製造方法 |
| JPS59117236A (ja) * | 1982-12-24 | 1984-07-06 | Hitachi Ltd | 半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6346979B2 (enrdf_load_stackoverflow) | 1988-09-20 |
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