JPS56161642A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56161642A
JPS56161642A JP6567880A JP6567880A JPS56161642A JP S56161642 A JPS56161642 A JP S56161642A JP 6567880 A JP6567880 A JP 6567880A JP 6567880 A JP6567880 A JP 6567880A JP S56161642 A JPS56161642 A JP S56161642A
Authority
JP
Japan
Prior art keywords
mask
measure
pattern
foreign matters
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6567880A
Other languages
English (en)
Inventor
Hisao Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
NEC Corp
Original Assignee
NEC Home Electronics Ltd
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd, Nippon Electric Co Ltd filed Critical NEC Home Electronics Ltd
Priority to JP6567880A priority Critical patent/JPS56161642A/ja
Publication of JPS56161642A publication Critical patent/JPS56161642A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6567880A 1980-05-15 1980-05-15 Manufacture of semiconductor device Pending JPS56161642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6567880A JPS56161642A (en) 1980-05-15 1980-05-15 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6567880A JPS56161642A (en) 1980-05-15 1980-05-15 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS56161642A true JPS56161642A (en) 1981-12-12

Family

ID=13293894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6567880A Pending JPS56161642A (en) 1980-05-15 1980-05-15 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56161642A (ja)

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