JPS5612742A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5612742A JPS5612742A JP8768279A JP8768279A JPS5612742A JP S5612742 A JPS5612742 A JP S5612742A JP 8768279 A JP8768279 A JP 8768279A JP 8768279 A JP8768279 A JP 8768279A JP S5612742 A JPS5612742 A JP S5612742A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ground
- extended
- circuit
- solder material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
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Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Die Bonding (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To prevent the short-circuit of a ground electrode with other electrodes by grounding the electrode with a solder material through a cut step which is provided at the end of the semiconductor pellet to have the electrode extended thereto. CONSTITUTION:On a semi-insulated GaAs substrate 2, the cut step (B) is formed at the pellet end of a GaAs FET which has a mesa active region II through a buffer layer 15 and a section 5b to have the ground electrode (source electrode) 5 extended thereto is formed at the step. The ground electrode is ground connected to a header 4 with the substrate back by the solder material. This eliminates short-circuit between a source electrode and a drain electrode. Extra slack of a wire 9a is not needed thereby reducing harmful inductance component drastically.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP8768279A JPS5612742A (en) | 1979-07-11 | 1979-07-11 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8768279A JPS5612742A (en) | 1979-07-11 | 1979-07-11 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
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JPS5612742A true JPS5612742A (en) | 1981-02-07 |
JPS6217395B2 JPS6217395B2 (en) | 1987-04-17 |
Family
ID=13921695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8768279A Granted JPS5612742A (en) | 1979-07-11 | 1979-07-11 | Semiconductor device |
Country Status (1)
Country | Link |
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JP (1) | JPS5612742A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02207894A (en) * | 1989-02-08 | 1990-08-17 | Chubu Electric Power Co Inc | Method for nitrification by using included and immobilized microorganism |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5341173A (en) * | 1976-09-28 | 1978-04-14 | Nec Corp | Manufacture of semiconductor device |
JPS5367374A (en) * | 1976-11-27 | 1978-06-15 | Nec Corp | Manufacture of schottky barrier field effect transistor |
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1979
- 1979-07-11 JP JP8768279A patent/JPS5612742A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5341173A (en) * | 1976-09-28 | 1978-04-14 | Nec Corp | Manufacture of semiconductor device |
JPS5367374A (en) * | 1976-11-27 | 1978-06-15 | Nec Corp | Manufacture of schottky barrier field effect transistor |
Also Published As
Publication number | Publication date |
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JPS6217395B2 (en) | 1987-04-17 |
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