JPS56114942A - High energy beam sensitive resist material and its using method - Google Patents

High energy beam sensitive resist material and its using method

Info

Publication number
JPS56114942A
JPS56114942A JP1653980A JP1653980A JPS56114942A JP S56114942 A JPS56114942 A JP S56114942A JP 1653980 A JP1653980 A JP 1653980A JP 1653980 A JP1653980 A JP 1653980A JP S56114942 A JPS56114942 A JP S56114942A
Authority
JP
Japan
Prior art keywords
pattern
resist material
sensitivity
energy beam
high energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1653980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS649613B2 (enrdf_load_stackoverflow
Inventor
Takaharu Kawazu
Mitsumasa Kunishi
Yoshio Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1653980A priority Critical patent/JPS56114942A/ja
Publication of JPS56114942A publication Critical patent/JPS56114942A/ja
Publication of JPS649613B2 publication Critical patent/JPS649613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1653980A 1980-02-15 1980-02-15 High energy beam sensitive resist material and its using method Granted JPS56114942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1653980A JPS56114942A (en) 1980-02-15 1980-02-15 High energy beam sensitive resist material and its using method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1653980A JPS56114942A (en) 1980-02-15 1980-02-15 High energy beam sensitive resist material and its using method

Publications (2)

Publication Number Publication Date
JPS56114942A true JPS56114942A (en) 1981-09-09
JPS649613B2 JPS649613B2 (enrdf_load_stackoverflow) 1989-02-17

Family

ID=11919063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1653980A Granted JPS56114942A (en) 1980-02-15 1980-02-15 High energy beam sensitive resist material and its using method

Country Status (1)

Country Link
JP (1) JPS56114942A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
JPS5984519A (ja) * 1982-11-08 1984-05-16 Hitachi Ltd 現像液

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
JPS5984519A (ja) * 1982-11-08 1984-05-16 Hitachi Ltd 現像液

Also Published As

Publication number Publication date
JPS649613B2 (enrdf_load_stackoverflow) 1989-02-17

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