JPS56112790A - Junction type semiconductor laser - Google Patents
Junction type semiconductor laserInfo
- Publication number
- JPS56112790A JPS56112790A JP1624880A JP1624880A JPS56112790A JP S56112790 A JPS56112790 A JP S56112790A JP 1624880 A JP1624880 A JP 1624880A JP 1624880 A JP1624880 A JP 1624880A JP S56112790 A JPS56112790 A JP S56112790A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- high resistance
- region
- type
- semiconductor laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/162—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions made by diffusion or disordening of the active layer
Abstract
PURPOSE:To prevent the deterioration or surface breakdown of the end face of the output of the semiconductor laser by forming the output end face for irradiating the light of the laser of high resistance semiconductor layer. CONSTITUTION:The first layer 2 of N type Ga1-xAlxAs, the second layer 3 of N or P type GaAs, the third layer 4 of P type Ga1-xAlxAs, and fourth layer 5 of P<+> type GaAs are sequentially formed on an N type GaAs substrate 1, and striped active region is formed. The striped region is formed, for example, by retaining the striped region, irradiating proton thereto to form a high resistance region, and the output end faces 6, 6' are not only formed in parallel with the stripe but have high resistance layer. In order to form the high resistance layer, there are methods of injecting oxygen or chromium atom by an ion injection in addition to the irradiation of the proton, but according to the above method very shallow high resistance layer can be formed, resulting in low loss.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1624880A JPS56112790A (en) | 1980-02-12 | 1980-02-12 | Junction type semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1624880A JPS56112790A (en) | 1980-02-12 | 1980-02-12 | Junction type semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56112790A true JPS56112790A (en) | 1981-09-05 |
Family
ID=11911251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1624880A Pending JPS56112790A (en) | 1980-02-12 | 1980-02-12 | Junction type semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56112790A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4830951A (en) * | 1986-09-19 | 1989-05-16 | Basf Aktiengesellschaft | Naphtholactamsquaric acid dyes and optical recording materials containing these dyes |
EP0589727A2 (en) * | 1992-09-25 | 1994-03-30 | The Furukawa Electric Co., Ltd. | Semiconductor laser device |
JP2022520738A (en) * | 2019-01-31 | 2022-04-01 | フェルディナント-ブラウン-インスティツット ゲーゲーエムベーハー, ライプニッツ-インスティツット フュー ヘーヒストフレクエンツテヒニク | Laser irradiation generator |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4866980A (en) * | 1971-12-17 | 1973-09-13 | ||
JPS516491A (en) * | 1974-07-04 | 1976-01-20 | Nippon Electric Co | Handotaireezano seizohoho |
-
1980
- 1980-02-12 JP JP1624880A patent/JPS56112790A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4866980A (en) * | 1971-12-17 | 1973-09-13 | ||
JPS516491A (en) * | 1974-07-04 | 1976-01-20 | Nippon Electric Co | Handotaireezano seizohoho |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4830951A (en) * | 1986-09-19 | 1989-05-16 | Basf Aktiengesellschaft | Naphtholactamsquaric acid dyes and optical recording materials containing these dyes |
EP0589727A2 (en) * | 1992-09-25 | 1994-03-30 | The Furukawa Electric Co., Ltd. | Semiconductor laser device |
EP0589727A3 (en) * | 1992-09-25 | 1994-08-10 | Furukawa Electric Co Ltd | Semiconductor laser device |
JP2022520738A (en) * | 2019-01-31 | 2022-04-01 | フェルディナント-ブラウン-インスティツット ゲーゲーエムベーハー, ライプニッツ-インスティツット フュー ヘーヒストフレクエンツテヒニク | Laser irradiation generator |
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