JPS56105636A - Formation of pattern - Google Patents

Formation of pattern

Info

Publication number
JPS56105636A
JPS56105636A JP854780A JP854780A JPS56105636A JP S56105636 A JPS56105636 A JP S56105636A JP 854780 A JP854780 A JP 854780A JP 854780 A JP854780 A JP 854780A JP S56105636 A JPS56105636 A JP S56105636A
Authority
JP
Japan
Prior art keywords
organic matter
oxide
mask
metal
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP854780A
Other languages
Japanese (ja)
Inventor
Sotaro Edokoro
Hiroshi Gokan
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP854780A priority Critical patent/JPS56105636A/en
Publication of JPS56105636A publication Critical patent/JPS56105636A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Abstract

PURPOSE:To obtain a mask utilizing the difference of etching speed by a method wherein a three-layers film consisting of an organic matter, a metal or an oxide, an organic matter is etched with O2 ion beam. CONSTITUTION:The etching speed of O2 ion beam acting as a reaction gas differs according to the material, and is slow against the metal and the oxide and is exceedingly rapid against the organic matter. Utilizing this quality, the three layers of organic matter-metal or oxide-organic matter are piled up and etching is performed in order to form the mask, and when the material to be processed is etched, the minute pattern can be formed, and moreover the drawing speed of O2 ion beam can be largely elevated than the case of a single layer organic matter mask.
JP854780A 1980-01-28 1980-01-28 Formation of pattern Pending JPS56105636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP854780A JPS56105636A (en) 1980-01-28 1980-01-28 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP854780A JPS56105636A (en) 1980-01-28 1980-01-28 Formation of pattern

Publications (1)

Publication Number Publication Date
JPS56105636A true JPS56105636A (en) 1981-08-22

Family

ID=11696155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP854780A Pending JPS56105636A (en) 1980-01-28 1980-01-28 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS56105636A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07288247A (en) * 1994-04-19 1995-10-31 Nec Corp Dry etching method for silicon oxide film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS546570A (en) * 1977-06-16 1979-01-18 Sumitomo Electric Ind Ltd Production of optical guides

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS546570A (en) * 1977-06-16 1979-01-18 Sumitomo Electric Ind Ltd Production of optical guides

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07288247A (en) * 1994-04-19 1995-10-31 Nec Corp Dry etching method for silicon oxide film

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