JPS56102823A - Positioning device - Google Patents

Positioning device

Info

Publication number
JPS56102823A
JPS56102823A JP515680A JP515680A JPS56102823A JP S56102823 A JPS56102823 A JP S56102823A JP 515680 A JP515680 A JP 515680A JP 515680 A JP515680 A JP 515680A JP S56102823 A JPS56102823 A JP S56102823A
Authority
JP
Japan
Prior art keywords
microscope
alignment
mark
coordinate
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP515680A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0353770B2 (enrdf_load_stackoverflow
Inventor
Kiwao Nakazawa
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP515680A priority Critical patent/JPS56102823A/ja
Priority to US06/225,049 priority patent/US4385838A/en
Publication of JPS56102823A publication Critical patent/JPS56102823A/ja
Publication of JPH0353770B2 publication Critical patent/JPH0353770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP515680A 1980-01-19 1980-01-19 Positioning device Granted JPS56102823A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device
US06/225,049 US4385838A (en) 1980-01-19 1981-01-14 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP515680A JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Publications (2)

Publication Number Publication Date
JPS56102823A true JPS56102823A (en) 1981-08-17
JPH0353770B2 JPH0353770B2 (enrdf_load_stackoverflow) 1991-08-16

Family

ID=11603394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP515680A Granted JPS56102823A (en) 1980-01-19 1980-01-19 Positioning device

Country Status (1)

Country Link
JP (1) JPS56102823A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (ja) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト 加工片上へのマスクの投影転写装置およびその調整方法
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
JPS62248224A (ja) * 1986-04-21 1987-10-29 Nikon Corp 投影露光装置
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH01161832A (ja) * 1987-12-18 1989-06-26 Nikon Corp 投影露光装置及び露光方法
JPH01309324A (ja) * 1988-06-07 1989-12-13 Nikon Corp 露光装置および位置合わせ方法
JPH0774095A (ja) * 1994-06-20 1995-03-17 Nikon Corp 露光装置
US6265119B1 (en) 1995-02-17 2001-07-24 Nikon Corporation Method for producing semiconductor devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5918950A (ja) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト 加工片上へのマスクの投影転写装置およびその調整方法
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
JPS62248224A (ja) * 1986-04-21 1987-10-29 Nikon Corp 投影露光装置
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH01161832A (ja) * 1987-12-18 1989-06-26 Nikon Corp 投影露光装置及び露光方法
JPH01309324A (ja) * 1988-06-07 1989-12-13 Nikon Corp 露光装置および位置合わせ方法
JPH0774095A (ja) * 1994-06-20 1995-03-17 Nikon Corp 露光装置
US6265119B1 (en) 1995-02-17 2001-07-24 Nikon Corporation Method for producing semiconductor devices

Also Published As

Publication number Publication date
JPH0353770B2 (enrdf_load_stackoverflow) 1991-08-16

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