JPS5597220A - Method of producing metal filter - Google Patents
Method of producing metal filterInfo
- Publication number
- JPS5597220A JPS5597220A JP393379A JP393379A JPS5597220A JP S5597220 A JPS5597220 A JP S5597220A JP 393379 A JP393379 A JP 393379A JP 393379 A JP393379 A JP 393379A JP S5597220 A JPS5597220 A JP S5597220A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photomask
- produce
- metal
- metal filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Filtering Materials (AREA)
- Combined Means For Separation Of Solids (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP393379A JPS5597220A (en) | 1979-01-19 | 1979-01-19 | Method of producing metal filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP393379A JPS5597220A (en) | 1979-01-19 | 1979-01-19 | Method of producing metal filter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5597220A true JPS5597220A (en) | 1980-07-24 |
JPS6249094B2 JPS6249094B2 (xx) | 1987-10-16 |
Family
ID=11570931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP393379A Granted JPS5597220A (en) | 1979-01-19 | 1979-01-19 | Method of producing metal filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5597220A (xx) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05181258A (ja) * | 1992-06-19 | 1993-07-23 | Hitachi Ltd | ホトマスク用原板 |
WO2001021282A2 (en) * | 1999-09-22 | 2001-03-29 | Viostyle Limited | Laminar structure |
JP2004504634A (ja) * | 2000-07-19 | 2004-02-12 | エーエスエムエル ユーエス,インコーポレイテッド | ホログラフィックレチクルを用いて光学システムを特徴付けする方法 |
US7804601B2 (en) | 1999-06-24 | 2010-09-28 | Asml Holding N.V. | Methods for making holographic reticles for characterizing optical systems |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110158025B (zh) * | 2018-05-31 | 2021-01-26 | 京东方科技集团股份有限公司 | 掩膜板的制作方法及掩膜板 |
-
1979
- 1979-01-19 JP JP393379A patent/JPS5597220A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05181258A (ja) * | 1992-06-19 | 1993-07-23 | Hitachi Ltd | ホトマスク用原板 |
JPH0715578B2 (ja) * | 1992-06-19 | 1995-02-22 | 株式会社日立製作所 | ホトマスク用原板 |
US7804601B2 (en) | 1999-06-24 | 2010-09-28 | Asml Holding N.V. | Methods for making holographic reticles for characterizing optical systems |
WO2001021282A2 (en) * | 1999-09-22 | 2001-03-29 | Viostyle Limited | Laminar structure |
WO2001021282A3 (en) * | 1999-09-22 | 2001-10-18 | Viostyle Ltd | Laminar structure |
US6794056B1 (en) | 1999-09-22 | 2004-09-21 | Nord Impianti S.R.L. | Laminar structure |
JP2004504634A (ja) * | 2000-07-19 | 2004-02-12 | エーエスエムエル ユーエス,インコーポレイテッド | ホログラフィックレチクルを用いて光学システムを特徴付けする方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6249094B2 (xx) | 1987-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2056307A1 (en) | Method of manufacturing a stamper | |
JPS57211732A (en) | X ray exposing mask and manufacture thereof | |
JPS5597220A (en) | Method of producing metal filter | |
JPS5630129A (en) | Manufacture of photomask | |
JPS60230650A (ja) | 微細パタ−ンの製作法 | |
JPS57106128A (en) | Forming method for pattern | |
JPS5443681A (en) | Electron beam light-exposing method | |
JPS5596952A (en) | Production of photomask | |
JPS55135837A (en) | Manufacture of photomask | |
JPS55128832A (en) | Method of making minute pattern | |
JPS5568626A (en) | Pattern formation | |
JPS57106034A (en) | Patterning method | |
JPS57212445A (en) | Production of photomask | |
JPS5799371A (en) | Formation of resin film | |
JPS5559722A (en) | Producing method of electron beam drawing photomask | |
JPS5452473A (en) | Forming method for coating for fine pattern | |
JPS53117383A (en) | Production of photo mask | |
JPS5594491A (en) | Forming method for thick minute metal pattern | |
JPS57132008A (en) | Measuring method for pattern size | |
JPS57212446A (en) | Photomask for far ultraviolet exposure | |
DOERNER et al. | Photolithographic processes for small structures: Introduction and trial of electron beam lithography[Final Report, Nov. 1979] | |
JPS5475989A (en) | Pattern production method | |
JPS5689741A (en) | Dryplate for photomasking | |
JPS56167329A (en) | Piling joint setting mark to be used in fine processing exposure technology | |
JPS576848A (en) | Photomask and its preparation |