JPS5591184A - Photodiode - Google Patents

Photodiode

Info

Publication number
JPS5591184A
JPS5591184A JP16499478A JP16499478A JPS5591184A JP S5591184 A JPS5591184 A JP S5591184A JP 16499478 A JP16499478 A JP 16499478A JP 16499478 A JP16499478 A JP 16499478A JP S5591184 A JPS5591184 A JP S5591184A
Authority
JP
Japan
Prior art keywords
substrate
layer
type
film
gaas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16499478A
Other languages
Japanese (ja)
Inventor
Masanori Ito
Takao Kaneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16499478A priority Critical patent/JPS5591184A/en
Publication of JPS5591184A publication Critical patent/JPS5591184A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To reduce dark current in a photodiode by coating selectively the surface if a Ge substrate with GaAs layer.
CONSTITUTION: As or the like is diffused in a p-type Ge substrate to thereby form an n-type guard ring 3, and a p-type GaAs layer 11 is epitaxially formed in the substrate 1. Then, the layer 11 on the ring 3 is perforated with an opening, and coated selectively with SiO2 film 4 by CVD process. With the film 4 as a mask Se ion is implanted to the substrate to thereby form the GaAs layer 12 at the opening of the film 4 and the lower Ge substrate region 1 into n+-type layers. Then, a connecting opening is perforated to the layer 3 at the periphery of the layer 12, and an aluminum electrode 6 is connected thereto. Thus, the portion expanding the depletion layer on the surface of the Ge substrate is coated with the GaAs to thereby restrict the recoupling to thus largely reduce the dark current.
COPYRIGHT: (C)1980,JPO&Japio
JP16499478A 1978-12-27 1978-12-27 Photodiode Pending JPS5591184A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16499478A JPS5591184A (en) 1978-12-27 1978-12-27 Photodiode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16499478A JPS5591184A (en) 1978-12-27 1978-12-27 Photodiode

Publications (1)

Publication Number Publication Date
JPS5591184A true JPS5591184A (en) 1980-07-10

Family

ID=15803813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16499478A Pending JPS5591184A (en) 1978-12-27 1978-12-27 Photodiode

Country Status (1)

Country Link
JP (1) JPS5591184A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775761U (en) * 1980-10-29 1982-05-11
JPS5864071A (en) * 1981-10-13 1983-04-16 Nec Corp Semiconductor photodetector
US7271376B2 (en) 2002-07-11 2007-09-18 Qinetiq Limited Avalanche photodiode with reduced sidewall defects
US9755100B2 (en) 2016-01-29 2017-09-05 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
WO2019188244A1 (en) * 2018-03-27 2019-10-03 パナソニックIpマネジメント株式会社 Optical detector

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5775761U (en) * 1980-10-29 1982-05-11
JPS5864071A (en) * 1981-10-13 1983-04-16 Nec Corp Semiconductor photodetector
US7271376B2 (en) 2002-07-11 2007-09-18 Qinetiq Limited Avalanche photodiode with reduced sidewall defects
US9755100B2 (en) 2016-01-29 2017-09-05 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
US9853179B2 (en) 2016-01-29 2017-12-26 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
US10043938B2 (en) 2016-01-29 2018-08-07 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
US10236407B2 (en) 2016-01-29 2019-03-19 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
US10608138B2 (en) 2016-01-29 2020-03-31 International Business Machines Corporation Reducing dark current in germanium photodiodes by electrical over-stress
WO2019188244A1 (en) * 2018-03-27 2019-10-03 パナソニックIpマネジメント株式会社 Optical detector
JPWO2019188244A1 (en) * 2018-03-27 2021-03-25 パナソニックIpマネジメント株式会社 Photodetector

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