JPS5572052A - Preparation of semiconductor device - Google Patents
Preparation of semiconductor deviceInfo
- Publication number
- JPS5572052A JPS5572052A JP14623778A JP14623778A JPS5572052A JP S5572052 A JPS5572052 A JP S5572052A JP 14623778 A JP14623778 A JP 14623778A JP 14623778 A JP14623778 A JP 14623778A JP S5572052 A JPS5572052 A JP S5572052A
- Authority
- JP
- Japan
- Prior art keywords
- film
- groove
- sio
- resist pattern
- separating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Drying Of Semiconductors (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14623778A JPS5572052A (en) | 1978-11-27 | 1978-11-27 | Preparation of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14623778A JPS5572052A (en) | 1978-11-27 | 1978-11-27 | Preparation of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5572052A true JPS5572052A (en) | 1980-05-30 |
JPS6262464B2 JPS6262464B2 (enrdf_load_stackoverflow) | 1987-12-26 |
Family
ID=15403195
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14623778A Granted JPS5572052A (en) | 1978-11-27 | 1978-11-27 | Preparation of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5572052A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5896751A (ja) * | 1981-12-03 | 1983-06-08 | Seiko Epson Corp | 半導体装置 |
JPS58101066U (ja) * | 1981-12-29 | 1983-07-09 | 日産ディーゼル工業株式会社 | 機関冷却水通路のサ−モスタツト装置 |
US4404735A (en) * | 1980-05-14 | 1983-09-20 | Fujitsu Limited | Method for manufacturing a field isolation structure for a semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158071A (ja) * | 1974-11-18 | 1976-05-21 | Nichiden Varian Kk | Supatsutaetsuchinguho |
JPS5383585A (en) * | 1976-12-27 | 1978-07-24 | Raytheon Co | Semiconductor structure and method of producing same |
-
1978
- 1978-11-27 JP JP14623778A patent/JPS5572052A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158071A (ja) * | 1974-11-18 | 1976-05-21 | Nichiden Varian Kk | Supatsutaetsuchinguho |
JPS5383585A (en) * | 1976-12-27 | 1978-07-24 | Raytheon Co | Semiconductor structure and method of producing same |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4404735A (en) * | 1980-05-14 | 1983-09-20 | Fujitsu Limited | Method for manufacturing a field isolation structure for a semiconductor device |
JPS5896751A (ja) * | 1981-12-03 | 1983-06-08 | Seiko Epson Corp | 半導体装置 |
JPS58101066U (ja) * | 1981-12-29 | 1983-07-09 | 日産ディーゼル工業株式会社 | 機関冷却水通路のサ−モスタツト装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6262464B2 (enrdf_load_stackoverflow) | 1987-12-26 |
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