JPS5569264A - Etching method - Google Patents

Etching method

Info

Publication number
JPS5569264A
JPS5569264A JP13983278A JP13983278A JPS5569264A JP S5569264 A JPS5569264 A JP S5569264A JP 13983278 A JP13983278 A JP 13983278A JP 13983278 A JP13983278 A JP 13983278A JP S5569264 A JPS5569264 A JP S5569264A
Authority
JP
Japan
Prior art keywords
layer
work
etched
etching
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13983278A
Other languages
English (en)
Inventor
Hiroshi Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13983278A priority Critical patent/JPS5569264A/ja
Publication of JPS5569264A publication Critical patent/JPS5569264A/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP13983278A 1978-11-15 1978-11-15 Etching method Pending JPS5569264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13983278A JPS5569264A (en) 1978-11-15 1978-11-15 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13983278A JPS5569264A (en) 1978-11-15 1978-11-15 Etching method

Publications (1)

Publication Number Publication Date
JPS5569264A true JPS5569264A (en) 1980-05-24

Family

ID=15254523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13983278A Pending JPS5569264A (en) 1978-11-15 1978-11-15 Etching method

Country Status (1)

Country Link
JP (1) JPS5569264A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726171A (en) * 1980-07-24 1982-02-12 Nec Corp Dry etching method for molybdenum
US4376672A (en) * 1981-10-26 1983-03-15 Applied Materials, Inc. Materials and methods for plasma etching of oxides and nitrides of silicon
JPS5963730A (ja) * 1982-10-05 1984-04-11 Toshiba Corp 半導体装置の製造方法
JPS59104131A (ja) * 1982-11-18 1984-06-15 テキサス・インスツルメンツ・インコ−ポレイテツド 半導体装置の製造方法
JPS60186411A (ja) * 1984-03-06 1985-09-21 Anelva Corp ドライエツチング方法
US4645562A (en) * 1985-04-29 1987-02-24 Hughes Aircraft Company Double layer photoresist technique for side-wall profile control in plasma etching processes

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5726171A (en) * 1980-07-24 1982-02-12 Nec Corp Dry etching method for molybdenum
US4376672A (en) * 1981-10-26 1983-03-15 Applied Materials, Inc. Materials and methods for plasma etching of oxides and nitrides of silicon
JPS5963730A (ja) * 1982-10-05 1984-04-11 Toshiba Corp 半導体装置の製造方法
JPS59104131A (ja) * 1982-11-18 1984-06-15 テキサス・インスツルメンツ・インコ−ポレイテツド 半導体装置の製造方法
JPS60186411A (ja) * 1984-03-06 1985-09-21 Anelva Corp ドライエツチング方法
US4645562A (en) * 1985-04-29 1987-02-24 Hughes Aircraft Company Double layer photoresist technique for side-wall profile control in plasma etching processes

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