JPS5567215A - Forming method of reed screen type electrode in elastic surface wave element - Google Patents

Forming method of reed screen type electrode in elastic surface wave element

Info

Publication number
JPS5567215A
JPS5567215A JP14044378A JP14044378A JPS5567215A JP S5567215 A JPS5567215 A JP S5567215A JP 14044378 A JP14044378 A JP 14044378A JP 14044378 A JP14044378 A JP 14044378A JP S5567215 A JPS5567215 A JP S5567215A
Authority
JP
Japan
Prior art keywords
screen type
reed screen
weighting
photo mask
forming method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14044378A
Other languages
Japanese (ja)
Inventor
Noboru Wakatsuki
Masahiko Adachi
Shigeo Tanji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14044378A priority Critical patent/JPS5567215A/en
Publication of JPS5567215A publication Critical patent/JPS5567215A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To simplify the production of reed screen type electrodes dependent upon photo etching by separating a photo mask into a weighting pattern and a non- weighting pattern and producing the photo mask. CONSTITUTION:Red negative 11 where basic form 10 of reed screen type electrodes except weighting patterns is formed with approximately 100 magnifications, and film 13 where weighting patterns 12 are formed with the same magnification as red negative 11 is formed. Red negative and film 13 are superposed and reduced and photographed onto a dry-plate to form a photo mask. After that, the conductive thin film formed on a substrate is processed by this photo mask according to photo etching, thus producing reed screen type electrodes. Thus, this method can correspond to change of weighting patterns easily, and power for pattern generation is reduced considerably.
JP14044378A 1978-11-16 1978-11-16 Forming method of reed screen type electrode in elastic surface wave element Pending JPS5567215A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14044378A JPS5567215A (en) 1978-11-16 1978-11-16 Forming method of reed screen type electrode in elastic surface wave element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14044378A JPS5567215A (en) 1978-11-16 1978-11-16 Forming method of reed screen type electrode in elastic surface wave element

Publications (1)

Publication Number Publication Date
JPS5567215A true JPS5567215A (en) 1980-05-21

Family

ID=15268749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14044378A Pending JPS5567215A (en) 1978-11-16 1978-11-16 Forming method of reed screen type electrode in elastic surface wave element

Country Status (1)

Country Link
JP (1) JPS5567215A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992019042A1 (en) * 1991-04-11 1992-10-29 Siemens Matsushita Components Gmbh & Co. Kg Process for producing reflectors for differently codable reflective delay lines in surface wave technology

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147265A (en) * 1975-06-13 1976-12-17 Hitachi Ltd Miniature type pattern projector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147265A (en) * 1975-06-13 1976-12-17 Hitachi Ltd Miniature type pattern projector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992019042A1 (en) * 1991-04-11 1992-10-29 Siemens Matsushita Components Gmbh & Co. Kg Process for producing reflectors for differently codable reflective delay lines in surface wave technology

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