JPS5559728A - Insulating coating structure - Google Patents
Insulating coating structureInfo
- Publication number
- JPS5559728A JPS5559728A JP13163178A JP13163178A JPS5559728A JP S5559728 A JPS5559728 A JP S5559728A JP 13163178 A JP13163178 A JP 13163178A JP 13163178 A JP13163178 A JP 13163178A JP S5559728 A JPS5559728 A JP S5559728A
- Authority
- JP
- Japan
- Prior art keywords
- silicate glass
- phosphor silicate
- film
- nitride
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13163178A JPS5559728A (en) | 1978-10-27 | 1978-10-27 | Insulating coating structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13163178A JPS5559728A (en) | 1978-10-27 | 1978-10-27 | Insulating coating structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5559728A true JPS5559728A (en) | 1980-05-06 |
Family
ID=15062556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13163178A Pending JPS5559728A (en) | 1978-10-27 | 1978-10-27 | Insulating coating structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5559728A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63173332A (ja) * | 1987-01-12 | 1988-07-16 | Nec Corp | 半導体集積回路装置 |
-
1978
- 1978-10-27 JP JP13163178A patent/JPS5559728A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63173332A (ja) * | 1987-01-12 | 1988-07-16 | Nec Corp | 半導体集積回路装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55163860A (en) | Manufacture of semiconductor device | |
JPS5425178A (en) | Manufacture for semiconductor device | |
JPS52104062A (en) | Production of surface protection film of electronic parts | |
JPS5559728A (en) | Insulating coating structure | |
JPS54121082A (en) | Manufacture of semiconductor device | |
JPS5512735A (en) | Semiconductor device | |
JPS5513904A (en) | Semiconductor device and its manufacturing method | |
JPS57149752A (en) | Structure of multilayer wiring | |
JPS55113334A (en) | Manufacture of passivation film | |
JPS5555546A (en) | Method of wiring semiconductor device | |
JPS6482652A (en) | Manufacture of semiconductor device | |
JPS5247689A (en) | Process for production of semiconductor device | |
JPS5268371A (en) | Semiconductor device | |
JPS56116641A (en) | Manufacture of semiconductor device | |
JPS5544734A (en) | Semiconductor device | |
JPS5227362A (en) | Formation method of passivation film | |
JPS56129645A (en) | Forming method for metallic thin film | |
JPS5376752A (en) | Production of semionductor device | |
JPS55127062A (en) | Semiconductor device | |
JPS54121057A (en) | Semiconductor device | |
JPS54140884A (en) | Manufacture of semiconductor device | |
JPS55111163A (en) | Semiconductor device and manufacturing method thereof | |
JPS5544756A (en) | Semiconductor and manufacture thereof | |
JPS559489A (en) | Method of making semiconductor device | |
JPS54150972A (en) | Forming method for semiconductor thin film |