JPS5555529A - Method of positioning wafer - Google Patents

Method of positioning wafer

Info

Publication number
JPS5555529A
JPS5555529A JP12836778A JP12836778A JPS5555529A JP S5555529 A JPS5555529 A JP S5555529A JP 12836778 A JP12836778 A JP 12836778A JP 12836778 A JP12836778 A JP 12836778A JP S5555529 A JPS5555529 A JP S5555529A
Authority
JP
Japan
Prior art keywords
wafer
focal plane
parallel setting
pressure
moved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12836778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259457B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Nishizuka
Susumu Komoriya
Mitsuhiro Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12836778A priority Critical patent/JPS5555529A/ja
Priority to GB8040960A priority patent/GB2063524B/en
Priority to GB8040959A priority patent/GB2063523B/en
Priority to GB7936237A priority patent/GB2035610B/en
Priority to DE19792942388 priority patent/DE2942388A1/de
Priority to US06/087,387 priority patent/US4298273A/en
Publication of JPS5555529A publication Critical patent/JPS5555529A/ja
Priority to SG404/84A priority patent/SG40484G/en
Priority to SG40884A priority patent/SG40884G/en
Priority to HK361/85A priority patent/HK36185A/xx
Priority to HK356/85A priority patent/HK35685A/xx
Priority to HK684/85A priority patent/HK68485A/xx
Priority to MY663/85A priority patent/MY8500663A/xx
Priority to MY669/85A priority patent/MY8500669A/xx
Priority to MY1985670A priority patent/MY8500670A/xx
Publication of JPS6259457B2 publication Critical patent/JPS6259457B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12836778A 1978-10-20 1978-10-20 Method of positioning wafer Granted JPS5555529A (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP12836778A JPS5555529A (en) 1978-10-20 1978-10-20 Method of positioning wafer
GB8040960A GB2063524B (en) 1978-10-20 1979-10-18 Method of positioning a wafer in a projection aligner
GB8040959A GB2063523B (en) 1978-10-20 1979-10-18 Wafer position setting apparatus
GB7936237A GB2035610B (en) 1978-10-20 1979-10-18 Wafer projection aligner
DE19792942388 DE2942388A1 (de) 1978-10-20 1979-10-19 Halbleiterplaettchen-positioniervorrichtung
US06/087,387 US4298273A (en) 1978-10-20 1979-10-22 Projection aligner and method of positioning a wafer
SG40884A SG40884G (en) 1978-10-20 1984-06-04 A method of positioning a wafer in a projection aligner
SG404/84A SG40484G (en) 1978-10-20 1984-06-04 Projection aligner
HK361/85A HK36185A (en) 1978-10-20 1985-05-09 Wafer position setting apparatus
HK356/85A HK35685A (en) 1978-10-20 1985-05-09 Projection aligner
HK684/85A HK68485A (en) 1978-10-20 1985-09-12 A method of positioning a wafer in a projection aligner
MY663/85A MY8500663A (en) 1978-10-20 1985-12-30 Projection aligner
MY669/85A MY8500669A (en) 1978-10-20 1985-12-30 Water position setting apparatus
MY1985670A MY8500670A (en) 1978-10-20 1985-12-31 A method of positioning a wafer in a protection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12836778A JPS5555529A (en) 1978-10-20 1978-10-20 Method of positioning wafer

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59137156A Division JPS6063929A (ja) 1984-07-04 1984-07-04 板状物の光学処理装置

Publications (2)

Publication Number Publication Date
JPS5555529A true JPS5555529A (en) 1980-04-23
JPS6259457B2 JPS6259457B2 (enrdf_load_stackoverflow) 1987-12-11

Family

ID=14983062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12836778A Granted JPS5555529A (en) 1978-10-20 1978-10-20 Method of positioning wafer

Country Status (1)

Country Link
JP (1) JPS5555529A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS571229A (en) * 1980-05-02 1982-01-06 Perkin Elmer Corp Device for automatically positioning wafer
DE3133414A1 (de) 1980-08-25 1982-04-08 Citizen Watch Co., Ltd., Tokyo Verfahren zum herstellen eines uhrzeigers
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置
JPS62198121A (ja) * 1986-02-26 1987-09-01 Toshiba Corp 露光装置
CN107344327A (zh) * 2017-05-05 2017-11-14 清华大学 在线改良晶圆表面平坦度的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922868A (enrdf_load_stackoverflow) * 1972-06-20 1974-02-28
JPS5330878A (en) * 1976-09-03 1978-03-23 Fujitsu Ltd Focus adjusting device in projection type exposure apparatus
JPS5359371A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Mask alignment unit
JPS5375773A (en) * 1976-12-17 1978-07-05 Fujitsu Ltd Automatic focussing unit
JPS5381569U (enrdf_load_stackoverflow) * 1976-12-09 1978-07-06

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4922868A (enrdf_load_stackoverflow) * 1972-06-20 1974-02-28
JPS5330878A (en) * 1976-09-03 1978-03-23 Fujitsu Ltd Focus adjusting device in projection type exposure apparatus
JPS5359371A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Mask alignment unit
JPS5381569U (enrdf_load_stackoverflow) * 1976-12-09 1978-07-06
JPS5375773A (en) * 1976-12-17 1978-07-05 Fujitsu Ltd Automatic focussing unit

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS571229A (en) * 1980-05-02 1982-01-06 Perkin Elmer Corp Device for automatically positioning wafer
DE3133414A1 (de) 1980-08-25 1982-04-08 Citizen Watch Co., Ltd., Tokyo Verfahren zum herstellen eines uhrzeigers
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置
JPS62198121A (ja) * 1986-02-26 1987-09-01 Toshiba Corp 露光装置
CN107344327A (zh) * 2017-05-05 2017-11-14 清华大学 在线改良晶圆表面平坦度的方法
CN107344327B (zh) * 2017-05-05 2019-11-22 清华大学 在线改良晶圆表面平坦度的方法

Also Published As

Publication number Publication date
JPS6259457B2 (enrdf_load_stackoverflow) 1987-12-11

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