JPS5571025A - Providing fine gap - Google Patents
Providing fine gapInfo
- Publication number
- JPS5571025A JPS5571025A JP14421378A JP14421378A JPS5571025A JP S5571025 A JPS5571025 A JP S5571025A JP 14421378 A JP14421378 A JP 14421378A JP 14421378 A JP14421378 A JP 14421378A JP S5571025 A JPS5571025 A JP S5571025A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- gage
- mask
- movement
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain amount of movement to provide a gap between a mask and wafer, by specifying a standard amount of movement with respect to the mask of a wafer table by using a gage, and measuring the thickness of a wafer on the table as the difference in thicknesses of the gage.
CONSTITUTION: A gage 12 whose size is approximately the same as a wafer of interest is placed on a wafer table which is arranged at a position A. A value X0 is obtained by measuring with a contactless measuring device. A unit 5 is lifted so that the upper surface of a gage 12 is contacted with the lower surface of a mask 10. The distance of the movement of the gage is calculated to be Z0 with an electric microswitch. The gage is relaced by a wafer 13, and it is measured with a measuring device 8, and a value X is obtained. The difference ΔX between the wafer and the gage is obtained by X-X0. The unit is moved to a position B, and a gap G is provided between the upper surface of the wafer and the lower surfce of the mask. The amount of the movement of the wafer Z can be obtained by Z0-G-ΔX.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14421378A JPS5571025A (en) | 1978-11-24 | 1978-11-24 | Providing fine gap |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14421378A JPS5571025A (en) | 1978-11-24 | 1978-11-24 | Providing fine gap |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5571025A true JPS5571025A (en) | 1980-05-28 |
Family
ID=15356857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14421378A Pending JPS5571025A (en) | 1978-11-24 | 1978-11-24 | Providing fine gap |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5571025A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4397078A (en) * | 1980-08-11 | 1983-08-09 | Telmec Co., Ltd. | Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits |
US5174201A (en) * | 1991-06-07 | 1992-12-29 | International Business Machines Corporation | Thick film mask separation detection system |
US5693439A (en) * | 1992-12-25 | 1997-12-02 | Nikon Corporation | Exposure method and apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50152670A (en) * | 1974-05-28 | 1975-12-08 |
-
1978
- 1978-11-24 JP JP14421378A patent/JPS5571025A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50152670A (en) * | 1974-05-28 | 1975-12-08 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4397078A (en) * | 1980-08-11 | 1983-08-09 | Telmec Co., Ltd. | Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor integrated circuits |
US5174201A (en) * | 1991-06-07 | 1992-12-29 | International Business Machines Corporation | Thick film mask separation detection system |
US5693439A (en) * | 1992-12-25 | 1997-12-02 | Nikon Corporation | Exposure method and apparatus |
US6433872B1 (en) | 1992-12-25 | 2002-08-13 | Nikon Corporation | Exposure method and apparatus |
US6608681B2 (en) | 1992-12-25 | 2003-08-19 | Nikon Corporation | Exposure method and apparatus |
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