SG40884G - A method of positioning a wafer in a projection aligner - Google Patents

A method of positioning a wafer in a projection aligner

Info

Publication number
SG40884G
SG40884G SG40884A SG40884A SG40884G SG 40884 G SG40884 G SG 40884G SG 40884 A SG40884 A SG 40884A SG 40884 A SG40884 A SG 40884A SG 40884 G SG40884 G SG 40884G
Authority
SG
Singapore
Prior art keywords
wafer
positioning
projection aligner
aligner
projection
Prior art date
Application number
SG40884A
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP12836778A external-priority patent/JPS5555529A/en
Priority claimed from JP7821379A external-priority patent/JPS562630A/en
Priority claimed from JP8692679A external-priority patent/JPS5612725A/en
Priority claimed from GB7936237A external-priority patent/GB2035610B/en
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of SG40884G publication Critical patent/SG40884G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
SG40884A 1978-10-20 1984-06-04 A method of positioning a wafer in a projection aligner SG40884G (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP12836778A JPS5555529A (en) 1978-10-20 1978-10-20 Method of positioning wafer
JP7821379A JPS562630A (en) 1979-06-22 1979-06-22 Installing of wafer position in projection aligner
JP8692679A JPS5612725A (en) 1979-07-11 1979-07-11 Method and apparatus for setting position of wafer in projection aligner
GB7936237A GB2035610B (en) 1978-10-20 1979-10-18 Wafer projection aligner

Publications (1)

Publication Number Publication Date
SG40884G true SG40884G (en) 1985-03-08

Family

ID=27449144

Family Applications (1)

Application Number Title Priority Date Filing Date
SG40884A SG40884G (en) 1978-10-20 1984-06-04 A method of positioning a wafer in a projection aligner

Country Status (1)

Country Link
SG (1) SG40884G (en)

Similar Documents

Publication Publication Date Title
GB2063524B (en) Method of positioning a wafer in a projection aligner
DE2965924D1 (en) A method of making a semiconductor device
DE3071324D1 (en) Apparatus for prealignment of a wafer
GB2021859B (en) Method of making a semiconductor device
DE2966504D1 (en) Method of making a semiconductor laser
JPS5563827A (en) Method of forming narrow mask opening in silicon substrate
JPS54101676A (en) Method of and device for aligning photo mask
DE3275884D1 (en) A method for forming monocrystalline semiconductor film on insulating film
JPS56157033A (en) Method and device for positioning mask and wafer
DE2961594D1 (en) A process for providing ion-implanted regions in a semiconductive substrate
AU508451B2 (en) Method of manufacturing a semiconductor device
GB1537634A (en) Method of making a negative mask on a substrate
DE3367286D1 (en) Positioning method for mask set used in ic fabrication
GB2039030B (en) Alignment device for semiconductor masks and wafers
DE3376769D1 (en) A developer solution for a positive-working light-sensitive composition, and a method of development using the developer solution
GB1548520A (en) Method of manufacturing a semiconductor device
DE2964631D1 (en) Method for producing a semiconductor film
GB2035687B (en) Method of forming layers on a semiconductor device
AR229015A1 (en) METHOD FOR PREPARING A DIPEPTIDE
JPS54116233A (en) Developing method
EP0029369A3 (en) A method of manufacturing a semiconductor device
JPS54114977A (en) Method of contact exposing positive photo resist
DE2961365D1 (en) Method of manufacturing a semiconductor device
GB2028679B (en) Method of forming a liquid phase epitaxial film on a wafer
JPS5341984A (en) Method of positioning exposure mask