JPS5539645A - Dry taper etching - Google Patents

Dry taper etching

Info

Publication number
JPS5539645A
JPS5539645A JP11277778A JP11277778A JPS5539645A JP S5539645 A JPS5539645 A JP S5539645A JP 11277778 A JP11277778 A JP 11277778A JP 11277778 A JP11277778 A JP 11277778A JP S5539645 A JPS5539645 A JP S5539645A
Authority
JP
Japan
Prior art keywords
etching object
object film
film
etching
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11277778A
Other languages
Japanese (ja)
Other versions
JPS63945B2 (en
Inventor
Hiroshi Gokan
Sotaro Edokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11277778A priority Critical patent/JPS5539645A/en
Publication of JPS5539645A publication Critical patent/JPS5539645A/en
Publication of JPS63945B2 publication Critical patent/JPS63945B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To ensure highly-controllable taper etching by providing a process consisting of providing mask on etching object film, depositing auxiliary film over the whole surface of said etching object film, placing said etching object film on a rotary table, and etching said auxiliary film and etching object film by applying ion beam from a given angle with the normal of said etching object film.
CONSTITUTION: Etching object film 2 is formed on a substrate 1, and mask with thickness h is made of photo-resist 3. Next, auxiliary film 4 with thickness a' is deposited over the whole surface of said etching object film 2. When said etching object film 2 is etched by applying ion beam form angle θ with the normal of said etching object film 2 while rotated, such a form that the portions thereof at the edges of said mask 3 rise and the other inclined gently is given thereto depending on the incidence distribution of ion beam. Thereby, all materials can be subjected to one method of taper angle control in highly-reproducible dry treatment. Lastly, the remainder portion 5 of said mask is removed so that manufacture is completed.
COPYRIGHT: (C)1980,JPO&Japio
JP11277778A 1978-09-12 1978-09-12 Dry taper etching Granted JPS5539645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11277778A JPS5539645A (en) 1978-09-12 1978-09-12 Dry taper etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11277778A JPS5539645A (en) 1978-09-12 1978-09-12 Dry taper etching

Publications (2)

Publication Number Publication Date
JPS5539645A true JPS5539645A (en) 1980-03-19
JPS63945B2 JPS63945B2 (en) 1988-01-09

Family

ID=14595230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11277778A Granted JPS5539645A (en) 1978-09-12 1978-09-12 Dry taper etching

Country Status (1)

Country Link
JP (1) JPS5539645A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01222447A (en) * 1988-03-01 1989-09-05 Furukawa Electric Co Ltd:The Formation of etched mirror by ribe
JPH0677516A (en) * 1992-07-10 1994-03-18 Nippon Telegr & Teleph Corp <Ntt> Semiconductor photodetector and its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01222447A (en) * 1988-03-01 1989-09-05 Furukawa Electric Co Ltd:The Formation of etched mirror by ribe
JPH0677516A (en) * 1992-07-10 1994-03-18 Nippon Telegr & Teleph Corp <Ntt> Semiconductor photodetector and its manufacture

Also Published As

Publication number Publication date
JPS63945B2 (en) 1988-01-09

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