JPS57192264A - Method of etching - Google Patents
Method of etchingInfo
- Publication number
- JPS57192264A JPS57192264A JP7656281A JP7656281A JPS57192264A JP S57192264 A JPS57192264 A JP S57192264A JP 7656281 A JP7656281 A JP 7656281A JP 7656281 A JP7656281 A JP 7656281A JP S57192264 A JPS57192264 A JP S57192264A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist film
- substrate
- film
- prescribed
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To allow even a fine opening section to be subjected to uniform dry etching, by rendering a film surface section electrically-conductive before or after the photoresist film applied on a substrate is processed, and then exposing it to a plasma atmosphere.
CONSTITUTION: The photoresist film is applied on the prescribed substrate, the film is formed into a prescribed shape, and then the substrate is exposed to a prescribed plasma atmosphere so that dry etching is carried out. In this case, before or after the photoresist film is processed, at least the surface section of the photoresist film is rendered electrically-conductive. Accordingly, if high energy particles are flown through the plasma, the energy distribution or the density distribusion of the ions striking the sample surface will not be localized so that the etching can be uniformly effected.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7656281A JPS57192264A (en) | 1981-05-22 | 1981-05-22 | Method of etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7656281A JPS57192264A (en) | 1981-05-22 | 1981-05-22 | Method of etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57192264A true JPS57192264A (en) | 1982-11-26 |
Family
ID=13608677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7656281A Pending JPS57192264A (en) | 1981-05-22 | 1981-05-22 | Method of etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192264A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60153127A (en) * | 1984-01-23 | 1985-08-12 | Oki Electric Ind Co Ltd | Plasma etching device |
JPS6320830A (en) * | 1986-07-14 | 1988-01-28 | Toshiba Corp | Fine processing |
-
1981
- 1981-05-22 JP JP7656281A patent/JPS57192264A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60153127A (en) * | 1984-01-23 | 1985-08-12 | Oki Electric Ind Co Ltd | Plasma etching device |
JPS6320830A (en) * | 1986-07-14 | 1988-01-28 | Toshiba Corp | Fine processing |
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