JPS5539691A - Fabrication of fine pattern - Google Patents
Fabrication of fine patternInfo
- Publication number
- JPS5539691A JPS5539691A JP11395278A JP11395278A JPS5539691A JP S5539691 A JPS5539691 A JP S5539691A JP 11395278 A JP11395278 A JP 11395278A JP 11395278 A JP11395278 A JP 11395278A JP S5539691 A JPS5539691 A JP S5539691A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- mask
- pattern
- shape
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/40—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal all coatings being metal coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To obtain high accuracy pattern at the time of making a pattern of multi- crystal Si layer stacked on the glass base in the fine pattern technology of the semiconductor integral circuit by covering Si layer with Au thin film on which a macromolecule resin mask is installed and by removing Si layer and Au layer exposed after dry etching.
CONSTITUTION: On a glass base plate 1, a multi-crystal si layer 2 for making the pattern is stacked and then an Au layer 3 having about 100Å in whole surface is stuck. Next, in the designated part of above mentioned layer 3, a macromolecule mask 4 like polyglycidyl methacrylate is installed and after that the Au layer 3 and the Si layer 2 is undergone a dry etching by using a spatter method of parallel plain plate shape through a gas. By doing so, a fine particle 3' of a chemical compound including Au or of Au itself produced at the etching operation is covered to the side face of the mask 4, so no deformation is observed in the mask resulting that it is possible to make the shape of the layer 2 same as the shape of the mask 4. After that, the fine particle 3' is removed by iodine and the mask 4 is removed by O2 plasma.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11395278A JPS5539691A (en) | 1978-09-14 | 1978-09-14 | Fabrication of fine pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11395278A JPS5539691A (en) | 1978-09-14 | 1978-09-14 | Fabrication of fine pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5539691A true JPS5539691A (en) | 1980-03-19 |
Family
ID=14625312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11395278A Pending JPS5539691A (en) | 1978-09-14 | 1978-09-14 | Fabrication of fine pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5539691A (en) |
-
1978
- 1978-09-14 JP JP11395278A patent/JPS5539691A/en active Pending
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