JPS5534413A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS5534413A JPS5534413A JP10618778A JP10618778A JPS5534413A JP S5534413 A JPS5534413 A JP S5534413A JP 10618778 A JP10618778 A JP 10618778A JP 10618778 A JP10618778 A JP 10618778A JP S5534413 A JPS5534413 A JP S5534413A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- corners
- charged
- beams
- assuming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10618778A JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10618778A JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5534413A true JPS5534413A (en) | 1980-03-11 |
JPS6157697B2 JPS6157697B2 (enrdf_load_stackoverflow) | 1986-12-08 |
Family
ID=14427193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10618778A Granted JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534413A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5745238A (en) * | 1980-07-10 | 1982-03-15 | Ibm | Method of correcting proximity effect |
-
1978
- 1978-09-01 JP JP10618778A patent/JPS5534413A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5745238A (en) * | 1980-07-10 | 1982-03-15 | Ibm | Method of correcting proximity effect |
Also Published As
Publication number | Publication date |
---|---|
JPS6157697B2 (enrdf_load_stackoverflow) | 1986-12-08 |
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