JPS6157697B2 - - Google Patents

Info

Publication number
JPS6157697B2
JPS6157697B2 JP10618778A JP10618778A JPS6157697B2 JP S6157697 B2 JPS6157697 B2 JP S6157697B2 JP 10618778 A JP10618778 A JP 10618778A JP 10618778 A JP10618778 A JP 10618778A JP S6157697 B2 JPS6157697 B2 JP S6157697B2
Authority
JP
Japan
Prior art keywords
pattern
amount
charge
correction
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10618778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5534413A (en
Inventor
Hisashi Sugyama
Kazunori Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP10618778A priority Critical patent/JPS5534413A/ja
Publication of JPS5534413A publication Critical patent/JPS5534413A/ja
Publication of JPS6157697B2 publication Critical patent/JPS6157697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10618778A 1978-09-01 1978-09-01 Pattern forming method Granted JPS5534413A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10618778A JPS5534413A (en) 1978-09-01 1978-09-01 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10618778A JPS5534413A (en) 1978-09-01 1978-09-01 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5534413A JPS5534413A (en) 1980-03-11
JPS6157697B2 true JPS6157697B2 (enrdf_load_stackoverflow) 1986-12-08

Family

ID=14427193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10618778A Granted JPS5534413A (en) 1978-09-01 1978-09-01 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5534413A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3067832D1 (en) * 1980-07-10 1984-06-20 Ibm Process for compensating the proximity effect in electron beam projection devices

Also Published As

Publication number Publication date
JPS5534413A (en) 1980-03-11

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