JPH0547969B2 - - Google Patents

Info

Publication number
JPH0547969B2
JPH0547969B2 JP5298282A JP5298282A JPH0547969B2 JP H0547969 B2 JPH0547969 B2 JP H0547969B2 JP 5298282 A JP5298282 A JP 5298282A JP 5298282 A JP5298282 A JP 5298282A JP H0547969 B2 JPH0547969 B2 JP H0547969B2
Authority
JP
Japan
Prior art keywords
pattern
electron beam
amount
residual film
irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP5298282A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58170015A (ja
Inventor
Yasuhide Machida
Shigeru Furuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5298282A priority Critical patent/JPS58170015A/ja
Publication of JPS58170015A publication Critical patent/JPS58170015A/ja
Publication of JPH0547969B2 publication Critical patent/JPH0547969B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP5298282A 1982-03-31 1982-03-31 電子ビ−ム露光方法 Granted JPS58170015A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5298282A JPS58170015A (ja) 1982-03-31 1982-03-31 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5298282A JPS58170015A (ja) 1982-03-31 1982-03-31 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS58170015A JPS58170015A (ja) 1983-10-06
JPH0547969B2 true JPH0547969B2 (enrdf_load_stackoverflow) 1993-07-20

Family

ID=12930106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5298282A Granted JPS58170015A (ja) 1982-03-31 1982-03-31 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS58170015A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0748472B2 (ja) * 1989-01-13 1995-05-24 株式会社東芝 電子ビーム描画によるパターン形成方法
JP2013207045A (ja) * 2012-03-28 2013-10-07 Toppan Printing Co Ltd パターン描画方法およびそれを用いるパターン描画装置

Also Published As

Publication number Publication date
JPS58170015A (ja) 1983-10-06

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