JPS5533035A - Forming of resist pattern shaped like inverted truncated pyramid - Google Patents

Forming of resist pattern shaped like inverted truncated pyramid

Info

Publication number
JPS5533035A
JPS5533035A JP10505378A JP10505378A JPS5533035A JP S5533035 A JPS5533035 A JP S5533035A JP 10505378 A JP10505378 A JP 10505378A JP 10505378 A JP10505378 A JP 10505378A JP S5533035 A JPS5533035 A JP S5533035A
Authority
JP
Japan
Prior art keywords
resist
substrate
pattern
truncated pyramid
inverted truncated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10505378A
Other languages
English (en)
Inventor
Hisanao Tsuge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10505378A priority Critical patent/JPS5533035A/ja
Publication of JPS5533035A publication Critical patent/JPS5533035A/ja
Pending legal-status Critical Current

Links

JP10505378A 1978-08-28 1978-08-28 Forming of resist pattern shaped like inverted truncated pyramid Pending JPS5533035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10505378A JPS5533035A (en) 1978-08-28 1978-08-28 Forming of resist pattern shaped like inverted truncated pyramid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10505378A JPS5533035A (en) 1978-08-28 1978-08-28 Forming of resist pattern shaped like inverted truncated pyramid

Publications (1)

Publication Number Publication Date
JPS5533035A true JPS5533035A (en) 1980-03-08

Family

ID=14397235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10505378A Pending JPS5533035A (en) 1978-08-28 1978-08-28 Forming of resist pattern shaped like inverted truncated pyramid

Country Status (1)

Country Link
JP (1) JPS5533035A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228648A (ja) * 1983-06-10 1984-12-22 Sumitomo Electric Ind Ltd ホトレジストの現像法
JPS61156044A (ja) * 1984-12-27 1986-07-15 Nec Corp レジストステンシルマスクの製造方法
JPS6286726A (ja) * 1985-10-11 1987-04-21 Mitsubishi Electric Corp レジストパタ−ン形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373073A (en) * 1976-12-11 1978-06-29 Fujitsu Ltd Treatment method for photo resist

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373073A (en) * 1976-12-11 1978-06-29 Fujitsu Ltd Treatment method for photo resist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228648A (ja) * 1983-06-10 1984-12-22 Sumitomo Electric Ind Ltd ホトレジストの現像法
JPS61156044A (ja) * 1984-12-27 1986-07-15 Nec Corp レジストステンシルマスクの製造方法
JPS6286726A (ja) * 1985-10-11 1987-04-21 Mitsubishi Electric Corp レジストパタ−ン形成方法

Similar Documents

Publication Publication Date Title
JPS5669835A (en) Method for forming thin film pattern
JPS5569265A (en) Pattern-forming method
JPS5557807A (en) Production of diffraction grating
JPS5533035A (en) Forming of resist pattern shaped like inverted truncated pyramid
JPS52119172A (en) Forming method of fine pattern
JPS5539646A (en) Ion taper etching
JPS5539645A (en) Dry taper etching
JPS5558374A (en) Etching method
JPS563679A (en) Formation of metallic pattern
JPS5679428A (en) Working of ultra-fine article
JPS5646230A (en) Exposing method
JPS5735860A (en) Preparation of photomask
JPS5673435A (en) Manufacture of semiconductor device
JPS5448485A (en) Photo etching method
JPS52127173A (en) Pattern formation method
JPS5573892A (en) Pattern forming method for metal film
JPS5471052A (en) Method of producing metal pattern
JPS54159873A (en) Forming method of pattern on thin film
JPS5645029A (en) Polyimide pattern forming method
JPS54162460A (en) Electrode forming method
JPS5527637A (en) Photo-resist-pattern forming method
JPS5612736A (en) Formation of fine chromium pattern
JPS5690539A (en) Production of semiconductor device
JPS57208143A (en) Method for forming fine pattern
JPS55158635A (en) Mask